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RET simulations for SLM-based maskless lithography
Guo, XlaoWei1,2; Du, Jinglei2; Luo, Xiangang3; Deng, Qiling3; Du, Chunlei3
Indexed BySCI ; ISTP
WOS IDWOS:000257413400048
AbstractIn this paper, we have preformed some simulations of reticle enhancement techniques (RET) for SLM-based maskless lithography. Our results show that, on the one hand, increased slope and larger process window can be simultaneously obtained by overtilting some mirrors around the printed structure; On the other hand, fully making use of the grayscaling generated by tilting a mirror across it, a maskless tool can use the same OPC model as a mask-based scanner, such as gray level serifs, sub-resolution scatter bars, transmittance controlled mask, and so on. The results also imply that optical maskless lithography (OML) provides the ability in attaining high resolution comparable to the mask-based lithography. (c) 2008 Elsevier B.V. All rights reserved.
KeywordOptical Maskless Lithography Spatial Light Modulator Reticle Enhancement Technique
WOS Research AreaEngineering ; Science & Technology - Other Topics ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
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Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Affiliation1.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
2.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
3.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Guo, XlaoWei,Du, Jinglei,Luo, Xiangang,et al. RET simulations for SLM-based maskless lithography[J]. MICROELECTRONIC ENGINEERING,2008,85(5-6):929-933.
APA Guo, XlaoWei,Du, Jinglei,Luo, Xiangang,Deng, Qiling,&Du, Chunlei.(2008).RET simulations for SLM-based maskless lithography.MICROELECTRONIC ENGINEERING,85(5-6),929-933.
MLA Guo, XlaoWei,et al."RET simulations for SLM-based maskless lithography".MICROELECTRONIC ENGINEERING 85.5-6(2008):929-933.
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