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Sub-diffraction-limited interference photolithography with metamaterials
Xu, Ting; Zhao, Yanhui; Ma, Junxian; Wang, Changtao; Cui, Jianhua; Du, Chunlei; Luo, Xiangang
Source PublicationOPTICS EXPRESS
Indexed BySCI
WOS IDWOS:000259270600011
AbstractWe present that an interference lithography technique beyond the diffraction limit can be theoretically achieved by positing an anisotropic metamaterial under the conventional lithographic mask. Based on the special dispersion characteristics of the metamaterial, only the enhanced evanescent waves with high spatial frequencies can transmit through the metamaterial and contribute to the lithography process. Rigorous coupled wave analysis shows that with 442nm exposure light, one-dimensional periodical structures with 40nm features can be patterned. This technique provides an alternative method to fabricate large-area nanostructures. (c) 2008 Optical Society of America.
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Cited Times:51[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
AffiliationChinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Xu, Ting,Zhao, Yanhui,Ma, Junxian,et al. Sub-diffraction-limited interference photolithography with metamaterials[J]. OPTICS EXPRESS,2008,16(18):13579-13584.
APA Xu, Ting.,Zhao, Yanhui.,Ma, Junxian.,Wang, Changtao.,Cui, Jianhua.,...&Luo, Xiangang.(2008).Sub-diffraction-limited interference photolithography with metamaterials.OPTICS EXPRESS,16(18),13579-13584.
MLA Xu, Ting,et al."Sub-diffraction-limited interference photolithography with metamaterials".OPTICS EXPRESS 16.18(2008):13579-13584.
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