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题名:
Formation for bass-relief microprofiles based on an analytic formulation
作者: Shi Li-Fang; Dong Xiao-Chun; Deng Qi-Ling; Luo Xian-Gang; Du Chun-Lei
刊名: CHINESE PHYSICS LETTERS
出版日期: 2007-10-01
卷号: 24, 期号:10, 页码:2867-2869
文章类型: Article
英文摘要: A method of fast design and fabrication for bass-relief micro-profiles is developed by using an analytic formulation to determine the exposure distribution. Based on an equivalent exposure threshold model, the formulation is simplified for the case of bass-relief profile corresponding to the smaller exposure dose. The mask function for a microlens array is designed without iteration involved by the analytic formulation. The experiment is performed to validate the method, and the fabrication result is obtained with the profile error less than 30 nm (rms).
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Physics, Multidisciplinary
研究领域[WOS]: Physics
收录类别: SCI
语种: 英语
WOS记录号: WOS:000249810900043
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3566
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Shi Li-Fang,Dong Xiao-Chun,Deng Qi-Ling,et al. Formation for bass-relief microprofiles based on an analytic formulation[J]. CHINESE PHYSICS LETTERS,2007,24(10):2867-2869.
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