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题名:
Simulation of DOE fabrication using DMD-based gray-tone lithography
作者: Guo, XW; Du, JL; Guo, YK; Du, CL; Cui, Z; Yao, J
刊名: MICROELECTRONIC ENGINEERING
出版日期: 2006-04-01
卷号: 83, 期号:4-9, 页码:1012-1016
关键词: digital gray-tone lithography ; imaging model ; exposure dose ; DMD ; DOE
文章类型: Article
英文摘要: Digital-multi-micromirror device (DMD)-based photolithography technique is a promising tool for the fabrication of microstructure. In this paper an imaging model was developed for describing its complicated imaging process, and then the fabrication processes of some typical diffractive optical elements (DOEs) were simulated. The simulated results demonstrate that the DMD-based lithography technique allows to realize a wide variety of microoptical elements, e.g., Dammann grating, Fresnel lens, beam shaping element or refractive micro structures. (c) 2006 Elsevier B.V. All rights reserved.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Science & Technology - Other Topics ; Optics ; Physics
关键词[WOS]: MASKLESS LITHOGRAPHY ; PROJECTION DISPLAY ; DEVICE
收录类别: ISTP ; SCI
语种: 英语
WOS记录号: WOS:000237581900094
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3546
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
2.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England
4.Univ Durham, Dept Phys, Durham DL1 3DJ, England

Recommended Citation:
Guo, XW,Du, JL,Guo, YK,et al. Simulation of DOE fabrication using DMD-based gray-tone lithography[J]. MICROELECTRONIC ENGINEERING,2006,83(4-9):1012-1016.
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