Knowledge Management System Of Institute of optics and electronics, CAS
| Simulation of DOE fabrication using DMD-based gray-tone lithography | |
| Guo, XW; Du, JL; Guo, YK; Du, CL; Cui, Z; Yao, J | |
| Source Publication | MICROELECTRONIC ENGINEERING
 |
| Volume | 83Issue:4-9Pages:1012-1016 |
| 2006-04-01 | |
| Language | 英语 |
| Indexed By | ISTP ; SCI |
| WOS ID | WOS:000237581900094 |
| Subtype | Article |
| Abstract | Digital-multi-micromirror device (DMD)-based photolithography technique is a promising tool for the fabrication of microstructure. In this paper an imaging model was developed for describing its complicated imaging process, and then the fabrication processes of some typical diffractive optical elements (DOEs) were simulated. The simulated results demonstrate that the DMD-based lithography technique allows to realize a wide variety of microoptical elements, e.g., Dammann grating, Fresnel lens, beam shaping element or refractive micro structures. (c) 2006 Elsevier B.V. All rights reserved. |
| Keyword | Digital Gray-tone Lithography Imaging Model Exposure Dose Dmd Doe |
| WOS Keyword | MASKLESS LITHOGRAPHY ; PROJECTION DISPLAY ; DEVICE |
| WOS Research Area | Engineering ; Science & Technology - Other Topics ; Optics ; Physics |
| WOS Subject | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/3546 |
| Collection | 光电技术研究所被WoS收录文章 |
| Affiliation | 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China 2.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China 3.Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England 4.Univ Durham, Dept Phys, Durham DL1 3DJ, England |
| Recommended Citation GB/T 7714 | Guo, XW,Du, JL,Guo, YK,et al. Simulation of DOE fabrication using DMD-based gray-tone lithography[J]. MICROELECTRONIC ENGINEERING,2006,83(4-9):1012-1016. |
| APA | Guo, XW,Du, JL,Guo, YK,Du, CL,Cui, Z,&Yao, J.(2006).Simulation of DOE fabrication using DMD-based gray-tone lithography.MICROELECTRONIC ENGINEERING,83(4-9),1012-1016. |
| MLA | Guo, XW,et al."Simulation of DOE fabrication using DMD-based gray-tone lithography".MICROELECTRONIC ENGINEERING 83.4-9(2006):1012-1016. |
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