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Simulation of DOE fabrication using DMD-based gray-tone lithography
Guo, XW; Du, JL; Guo, YK; Du, CL; Cui, Z; Yao, J
Source PublicationMICROELECTRONIC ENGINEERING
Volume83Issue:4-9Pages:1012-1016
2006-04-01
Language英语
Indexed ByISTP ; SCI
WOS IDWOS:000237581900094
SubtypeArticle
AbstractDigital-multi-micromirror device (DMD)-based photolithography technique is a promising tool for the fabrication of microstructure. In this paper an imaging model was developed for describing its complicated imaging process, and then the fabrication processes of some typical diffractive optical elements (DOEs) were simulated. The simulated results demonstrate that the DMD-based lithography technique allows to realize a wide variety of microoptical elements, e.g., Dammann grating, Fresnel lens, beam shaping element or refractive micro structures. (c) 2006 Elsevier B.V. All rights reserved.
KeywordDigital Gray-tone Lithography Imaging Model Exposure Dose Dmd Doe
WOS KeywordMASKLESS LITHOGRAPHY ; PROJECTION DISPLAY ; DEVICE
WOS Research AreaEngineering ; Science & Technology - Other Topics ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3546
Collection光电技术研究所被WoS收录文章
Affiliation1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
2.CAS, Inst Opt & Elect, Chengdu 610209, Peoples R China
3.Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England
4.Univ Durham, Dept Phys, Durham DL1 3DJ, England
Recommended Citation
GB/T 7714
Guo, XW,Du, JL,Guo, YK,et al. Simulation of DOE fabrication using DMD-based gray-tone lithography[J]. MICROELECTRONIC ENGINEERING,2006,83(4-9):1012-1016.
APA Guo, XW,Du, JL,Guo, YK,Du, CL,Cui, Z,&Yao, J.(2006).Simulation of DOE fabrication using DMD-based gray-tone lithography.MICROELECTRONIC ENGINEERING,83(4-9),1012-1016.
MLA Guo, XW,et al."Simulation of DOE fabrication using DMD-based gray-tone lithography".MICROELECTRONIC ENGINEERING 83.4-9(2006):1012-1016.
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