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题名:
Analysis of atom focusing in a standing wave laser field for nanometer-scale fabrication
作者: Chen, XZ; Shi, JP; Luo, XG; Zhang, CM; Chen, XN; Xing, TW; Du, CL; Yao, HM
刊名: MODERN PHYSICS LETTERS B
出版日期: 2006-02-10
卷号: 20, 期号:4, 页码:179-187
关键词: atom and neutron optics ; mechanical effects of light on atoms ; molecules, and ions ; fabrication techniques ; lithography, pattern transfer
文章类型: Article
英文摘要: We present a calculation model to investigate the focusing characteristics of an atomic beam in a laser standing wave, taking the wave nature of the atomic propagation into account. The effects of atom source, optical parameters of the laser field and the substrate position on atom focusing axe analyzed. Numerical simulations indicate that the best focusing performance can be obtained by repositioning the substrate or optimizing the longitudinal atomic beam speed, laser intensity and the detuning of the laser beam. The feature width of the nanostructure is mainly determined by the transverse speed distribution of atoms. Some methods for optimizing experimental parameters are suggested.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Physics, Applied ; Physics, Condensed Matter ; Physics, Mathematical
研究领域[WOS]: Physics
关键词[WOS]: LIGHT ; DEPOSITION ; LITHOGRAPHY ; OPTICS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000235741300005
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3529
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Chen, XZ,Shi, JP,Luo, XG,et al. Analysis of atom focusing in a standing wave laser field for nanometer-scale fabrication[J]. MODERN PHYSICS LETTERS B,2006,20(4):179-187.
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