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题名:
Variation of the deposition rate during ion beam sputter deposition of optical thin films
作者: Liu, HX; Xiong, SM; Li, LH; Zhang, YD
刊名: THIN SOLID FILMS
出版日期: 2005-07-22
卷号: 484, 期号:1-2, 页码:170-173
关键词: sputtering ; tantalum oxide ; optical coatings ; optical properties
文章类型: Article
英文摘要: Time-power monitoring technique was used for monitoring the thickness of optical films during ion beam sputter deposition. For Ta2O5, in the initial stage of coating, the growth rate increases with deposition time. While for SiO2, the rate increases first and then decreases. Both growth rates eventually stabilize when a proper ratio of atoms are sputtered from target materials. Finally, the mismatch of optical thickness and the inhomogeneity of film layers that affect substantially the optical performance of the samples were discussed. (c) 2005 Elsevier B.V. All rights reserved.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
研究领域[WOS]: Materials Science ; Physics
关键词[WOS]: OXIDE-FILMS ; TITANIUM ; STRESS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000230045900026
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3520
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Liu, HX,Xiong, SM,Li, LH,et al. Variation of the deposition rate during ion beam sputter deposition of optical thin films[J]. THIN SOLID FILMS,2005,484(1-2):170-173.
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