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题名:
Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens
作者: Li, BC; Xiong, SM; Zhang, YD; Martin, S; Welsch, E
刊名: OPTICS COMMUNICATIONS
出版日期: 2005-01-03
卷号: 244, 期号:1-6, 页码:367-376
关键词: nonlinear absorption coefficient ; surface thermal lens ; top-hat beam excitation ; LaF3/MgF2 ; multilayers ; MgF2
文章类型: Article
英文摘要: A sensitive pulsed top-hat beam thermal lens technique has been used to measure the nonlinear absorption coefficients of fused silica, CaF2, and MgF2 bulk materials, as well as LaF3/MgF2 layer pairs at 193 nm. The measurement values for the bulk materials are in agreement with the literature values. In case of LaF3/MgF2 layer pairs the absorption behavior of single MgF2 and LaF3 layers, (IL3H)(7), (3LIH)(7), and (LH)(20) LaF3/MgF2 multilayers, all deposited on CaF2 substrate. was evaluated. It was found that the nonlinear absorption coefficient of the LaF3/MgF2 multilayers was controlled by that of the LaF3 layers and was estimated to be approximately 4-7 x 10(-7) cm/W (C) 2004 Elsevier B.V. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: 193 NM ; TRANSMISSION PROPERTIES ; OPTICAL-COMPONENTS ; WINDOW MATERIALS ; COATINGS ; SCATTER ; LOSSES ; DUV
收录类别: SCI
语种: 英语
WOS记录号: WOS:000226433500046
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3519
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
2.Bundesanstalt Mat Forsch & Prufung, D-12205 Berlin, Germany
3.Univ Jena, Inst Opt & Quantenelekron, D-07743 Jena, Germany

Recommended Citation:
Li, BC,Xiong, SM,Zhang, YD,et al. Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens[J]. OPTICS COMMUNICATIONS,2005,244(1-6):367-376.
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