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Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens
Li, BC; Xiong, SM; Zhang, YD; Martin, S; Welsch, E
Source PublicationOPTICS COMMUNICATIONS
Volume244Issue:1-6Pages:367-376
2005-01-03
Language英语
Indexed BySCI
WOS IDWOS:000226433500046
SubtypeArticle
AbstractA sensitive pulsed top-hat beam thermal lens technique has been used to measure the nonlinear absorption coefficients of fused silica, CaF2, and MgF2 bulk materials, as well as LaF3/MgF2 layer pairs at 193 nm. The measurement values for the bulk materials are in agreement with the literature values. In case of LaF3/MgF2 layer pairs the absorption behavior of single MgF2 and LaF3 layers, (IL3H)(7), (3LIH)(7), and (LH)(20) LaF3/MgF2 multilayers, all deposited on CaF2 substrate. was evaluated. It was found that the nonlinear absorption coefficient of the LaF3/MgF2 multilayers was controlled by that of the LaF3 layers and was estimated to be approximately 4-7 x 10(-7) cm/W (C) 2004 Elsevier B.V. All rights reserved.
KeywordNonlinear Absorption Coefficient Surface Thermal Lens Top-hat Beam Excitation Laf3/mgf2 Multilayers Mgf2
WOS Keyword193 NM ; TRANSMISSION PROPERTIES ; OPTICAL-COMPONENTS ; WINDOW MATERIALS ; COATINGS ; SCATTER ; LOSSES ; DUV
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Cited Times:4[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3519
Collection光电技术研究所被WoS收录文章
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China
2.Bundesanstalt Mat Forsch & Prufung, D-12205 Berlin, Germany
3.Univ Jena, Inst Opt & Quantenelekron, D-07743 Jena, Germany
Recommended Citation
GB/T 7714
Li, BC,Xiong, SM,Zhang, YD,et al. Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens[J]. OPTICS COMMUNICATIONS,2005,244(1-6):367-376.
APA Li, BC,Xiong, SM,Zhang, YD,Martin, S,&Welsch, E.(2005).Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens.OPTICS COMMUNICATIONS,244(1-6),367-376.
MLA Li, BC,et al."Nonlinear absorption measurement of UV dielectric components by pulsed top-hat beam thermal lens".OPTICS COMMUNICATIONS 244.1-6(2005):367-376.
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