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题名:
Control approach for form accuracy of microlenses with continuous relief
作者: Dong, XC; Du, CL; Li, SH; Wang, CT; Fu, YQ
刊名: OPTICS EXPRESS
出版日期: 2005-03-07
卷号: 13, 期号:5, 页码:1353-1360
文章类型: Article
英文摘要: We describe a novel control approach for form accuracy of microlenses with continuous relief by control of exposure threshold. The approach can be achieved by analysis of the exposure distribution on photoresist and by deriving a relationship between the exposure distributions and the internal photoactive compound concentration (PAC) of the photoresist. The feature of parallel PAC curves for a specific value is determined in this way. We then analyze the development process and discover its critical effect on the approach. Finally we establish the relationship between the PAC distribution and the form accuracy of the relief. Not only is the fabricated relief height significantly increased to as high as 100 mum by use of this method, but we also realized effective fine control of the form accuracy of the continuous relief. With this approach we obtained micro- optic elements with 100-mum relief height and a form error (rms value) of less than 1 mum. (C) 2005 Optical Society of America.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: PHOTORESIST DISSOLUTION ; LITHOGRAPHY SIMULATION ; PARAMETER MEASUREMENTS ; ARRAY ; MODEL
收录类别: SCI
语种: 英语
WOS记录号: WOS:000227487700001
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3516
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Dong, XC,Du, CL,Li, SH,et al. Control approach for form accuracy of microlenses with continuous relief[J]. OPTICS EXPRESS,2005,13(5):1353-1360.
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