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Control approach for form accuracy of microlenses with continuous relief
Dong, XC; Du, CL; Li, SH; Wang, CT; Fu, YQ
Source PublicationOPTICS EXPRESS
Volume13Issue:5Pages:1353-1360
2005-03-07
Language英语
Indexed BySCI
WOS IDWOS:000227487700001
SubtypeArticle
AbstractWe describe a novel control approach for form accuracy of microlenses with continuous relief by control of exposure threshold. The approach can be achieved by analysis of the exposure distribution on photoresist and by deriving a relationship between the exposure distributions and the internal photoactive compound concentration (PAC) of the photoresist. The feature of parallel PAC curves for a specific value is determined in this way. We then analyze the development process and discover its critical effect on the approach. Finally we establish the relationship between the PAC distribution and the form accuracy of the relief. Not only is the fabricated relief height significantly increased to as high as 100 mum by use of this method, but we also realized effective fine control of the form accuracy of the continuous relief. With this approach we obtained micro- optic elements with 100-mum relief height and a form error (rms value) of less than 1 mum. (C) 2005 Optical Society of America.
WOS KeywordPHOTORESIST DISSOLUTION ; LITHOGRAPHY SIMULATION ; PARAMETER MEASUREMENTS ; ARRAY ; MODEL
WOS Research AreaOptics
WOS SubjectOptics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3516
Collection光电技术研究所被WoS收录文章
AffiliationChinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Dong, XC,Du, CL,Li, SH,et al. Control approach for form accuracy of microlenses with continuous relief[J]. OPTICS EXPRESS,2005,13(5):1353-1360.
APA Dong, XC,Du, CL,Li, SH,Wang, CT,&Fu, YQ.(2005).Control approach for form accuracy of microlenses with continuous relief.OPTICS EXPRESS,13(5),1353-1360.
MLA Dong, XC,et al."Control approach for form accuracy of microlenses with continuous relief".OPTICS EXPRESS 13.5(2005):1353-1360.
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