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题名:
Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave
作者: Chen, XZ; Yao, HM; Chen, XN
刊名: ACTA PHYSICA SINICA
出版日期: 2005-06-01
卷号: 54, 期号:6, 页码:2645-2652
关键词: completely off-resonant standing-wave laser field ; atom focusing ; nanostructure fabrication
文章类型: Article
英文摘要: The focusing of a thermal atomic beam to nanometer-scale dimensions can be realized by a completely off-resonant standing-wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on atom focusing are analyzed using the Monte-Carlo scheme and trajectory tracing method, and the simulation results have shown that the effective size of the target has a much more important effect on feature width than beam spread and longitudinal velocity spread. Several methods for improving experiments are presented.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Physics, Multidisciplinary
研究领域[WOS]: Physics
关键词[WOS]: BEAM ; LITHOGRAPHY ; FIELD
收录类别: SCI
语种: 英语
WOS记录号: WOS:000229684700035
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3510
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Chen, XZ,Yao, HM,Chen, XN. Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave[J]. ACTA PHYSICA SINICA,2005,54(6):2645-2652.
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