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Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave
Chen, XZ; Yao, HM; Chen, XN
Source PublicationACTA PHYSICA SINICA
Volume54Issue:6Pages:2645-2652
2005-06-01
Language英语
Indexed BySCI
WOS IDWOS:000229684700035
SubtypeArticle
AbstractThe focusing of a thermal atomic beam to nanometer-scale dimensions can be realized by a completely off-resonant standing-wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on atom focusing are analyzed using the Monte-Carlo scheme and trajectory tracing method, and the simulation results have shown that the effective size of the target has a much more important effect on feature width than beam spread and longitudinal velocity spread. Several methods for improving experiments are presented.
KeywordCompletely Off-resonant Standing-wave Laser Field Atom Focusing Nanostructure Fabrication
WOS KeywordBEAM ; LITHOGRAPHY ; FIELD
WOS Research AreaPhysics
WOS SubjectPhysics, Multidisciplinary
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3510
Collection光电技术研究所被WoS收录文章
AffiliationChinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Chen, XZ,Yao, HM,Chen, XN. Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave[J]. ACTA PHYSICA SINICA,2005,54(6):2645-2652.
APA Chen, XZ,Yao, HM,&Chen, XN.(2005).Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave.ACTA PHYSICA SINICA,54(6),2645-2652.
MLA Chen, XZ,et al."Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave".ACTA PHYSICA SINICA 54.6(2005):2645-2652.
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