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题名:
Profile control technology for high-performance microlens array
作者: Du, CL; Dong, XC; Qiu, CK; Deng, QL; Zhou, CX
刊名: OPTICAL ENGINEERING
出版日期: 2004-11-01
卷号: 43, 期号:11, 页码:2595-2602
关键词: profile control ; exposure dose function ; exposure threshold ; moving-mask lithography ; aspherical microlens arrays
文章类型: Article
英文摘要: A profile formation and control approach has been developed for manufacturing micro-optical elements with continuous profile and deep relief depth. Based on Dill's exposure model, an effective expression for determining the exposure dose function is established by using a supposition of equivalent exposure threshold inside a resist layer. An analytical simplified formula is further deduced by taking absorbance as constant B, and the approximate condition is discussed. For evaluating the simplified formula, the profile error was calculated and analyzed by simulation. With the exposure dose function, the binary mask for manipulating the light distribution by means of a moving-mask lithographic method can be designed. Experimental results are given and show the comparative performance to the required profile and relief depth. A series of refractive microlens arrays with aspherical profiles, a wide range of numerical apertures (0.005 to 0.6), and high fill factors were accomplished in the lab and may be applied to many systems. (C) 2004 society of Photo-Optical Instrumentation Engineers.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: GRAY-SCALE MASKS ; FABRICATION
收录类别: SCI
语种: 英语
WOS记录号: WOS:000225249900021
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3503
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol & Micorfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Du, CL,Dong, XC,Qiu, CK,et al. Profile control technology for high-performance microlens array[J]. OPTICAL ENGINEERING,2004,43(11):2595-2602.
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