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IOE OpenIR  > 光电技术研究所被WoS收录文章  > 期刊论文
题名:
Simulation of laser-focused atomic deposition for nanostructure fabrication
作者: Chen, XZ; Yao, HM; Chen, XN
刊名: OPTIK
出版日期: 2004
卷号: 115, 期号:6, 页码:241-247
关键词: atom manipulation ; nanofabrication ; atomlight interaction
文章类型: Article
英文摘要: We analyze the two-level atom focusing in a Gaussian standing wave laser field from the perspective of both classical mechanics and wave mechanics. The effects of source imperfection such as velocity spread and beam spread on the feature width are analyzed by numerically integrating the classical equation of atomic motion. The atomic flux distributions during its propagation in a laser field are calculated based on the Monte Carlo scheme and the trajectory tracing method, and results have shown that the focus depth of atom lens for real atomic source is longer than that for perfect source. In the absence of source imperfection, the contribution of diffractive aberration originating from the wave nature of the atom to broadening of feature width is larger than that of spherical aberration. Feature separation can be reduced by changing the detuning of the standing wave laser field from blue to red halfway through the deposition time.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: STANDING-WAVE ; LITHOGRAPHY ; LIGHT
收录类别: SCI
语种: 英语
WOS记录号: WOS:000224204500001
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3500
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Chen, XZ,Yao, HM,Chen, XN. Simulation of laser-focused atomic deposition for nanostructure fabrication[J]. OPTIK,2004,115(6):241-247.
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