IOE OpenIR  > 光电技术研究所被WoS收录文章
0.13 mu m photolithography using inverse Fourier transform convolution filtering
Zhou, CX; Luo, XG; Feng, B
Source PublicationOPTICAL ENGINEERING
Volume39Issue:11Pages:2943-2946
2000-11-01
Language英语
Indexed BySCI
WOS IDWOS:000165479400014
SubtypeArticle
AbstractDiscrete formulas to calculate aerial imaging on the wafer for photolithography are presented, and physical fundamental of inverse Fourier transform convolution filtering to improving resolution is discussed. The larger contrast for dense L/S group with the pitch of 0.27 mum is obtained with an ArF 193 nm stepper with a numerical aperture of 0.60 and partial coherent coefficients of 0.3. (C) 2000 Society of Photo-Optical Instrumentation Engineers. [S0091-3286(00)02010-9].
KeywordInverse Fourier Transform Convolution Filtering Pupil Filtering Wavefront Engineering Photolithography Resolution
WOS Research AreaOptics
WOS SubjectOptics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3481
Collection光电技术研究所被WoS收录文章
AffiliationChinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Zhou, CX,Luo, XG,Feng, B. 0.13 mu m photolithography using inverse Fourier transform convolution filtering[J]. OPTICAL ENGINEERING,2000,39(11):2943-2946.
APA Zhou, CX,Luo, XG,&Feng, B.(2000).0.13 mu m photolithography using inverse Fourier transform convolution filtering.OPTICAL ENGINEERING,39(11),2943-2946.
MLA Zhou, CX,et al."0.13 mu m photolithography using inverse Fourier transform convolution filtering".OPTICAL ENGINEERING 39.11(2000):2943-2946.
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