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作者单位: | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
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Recommended Citation: |
Zhou, CX,Luo, XG,Feng, B. 0.13 mu m photolithography using inverse Fourier transform convolution filtering[J]. OPTICAL ENGINEERING,2000,39(11):2943-2946.
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