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题名:
0.13 mu m photolithography using inverse Fourier transform convolution filtering
作者: Zhou, CX; Luo, XG; Feng, B
刊名: OPTICAL ENGINEERING
出版日期: 2000-11-01
卷号: 39, 期号:11, 页码:2943-2946
关键词: inverse Fourier transform ; convolution filtering ; pupil filtering ; wavefront engineering ; photolithography ; resolution
文章类型: Article
英文摘要: Discrete formulas to calculate aerial imaging on the wafer for photolithography are presented, and physical fundamental of inverse Fourier transform convolution filtering to improving resolution is discussed. The larger contrast for dense L/S group with the pitch of 0.27 mum is obtained with an ArF 193 nm stepper with a numerical aperture of 0.60 and partial coherent coefficients of 0.3. (C) 2000 Society of Photo-Optical Instrumentation Engineers. [S0091-3286(00)02010-9].
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
收录类别: SCI
语种: 英语
WOS记录号: WOS:000165479400014
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3481
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Zhou, CX,Luo, XG,Feng, B. 0.13 mu m photolithography using inverse Fourier transform convolution filtering[J]. OPTICAL ENGINEERING,2000,39(11):2943-2946.
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