Knowledge Management System Of Institute of optics and electronics, CAS
| 0.13 mu m photolithography using inverse Fourier transform convolution filtering | |
| Zhou, CX; Luo, XG; Feng, B | |
| Source Publication | OPTICAL ENGINEERING
 |
| Volume | 39Issue:11Pages:2943-2946 |
| 2000-11-01 | |
| Language | 英语 |
| Indexed By | SCI |
| WOS ID | WOS:000165479400014 |
| Subtype | Article |
| Abstract | Discrete formulas to calculate aerial imaging on the wafer for photolithography are presented, and physical fundamental of inverse Fourier transform convolution filtering to improving resolution is discussed. The larger contrast for dense L/S group with the pitch of 0.27 mum is obtained with an ArF 193 nm stepper with a numerical aperture of 0.60 and partial coherent coefficients of 0.3. (C) 2000 Society of Photo-Optical Instrumentation Engineers. [S0091-3286(00)02010-9]. |
| Keyword | Inverse Fourier Transform Convolution Filtering Pupil Filtering Wavefront Engineering Photolithography Resolution |
| WOS Research Area | Optics |
| WOS Subject | Optics |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/3481 |
| Collection | 光电技术研究所被WoS收录文章 |
| Affiliation | Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China |
| Recommended Citation GB/T 7714 | Zhou, CX,Luo, XG,Feng, B. 0.13 mu m photolithography using inverse Fourier transform convolution filtering[J]. OPTICAL ENGINEERING,2000,39(11):2943-2946. |
| APA | Zhou, CX,Luo, XG,&Feng, B.(2000).0.13 mu m photolithography using inverse Fourier transform convolution filtering.OPTICAL ENGINEERING,39(11),2943-2946. |
| MLA | Zhou, CX,et al."0.13 mu m photolithography using inverse Fourier transform convolution filtering".OPTICAL ENGINEERING 39.11(2000):2943-2946. |
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