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题名:
Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold
作者: Zhang, Yukun1,2; Du, Jinglei1; Wei, Xingzhan2; Shi, Lifang2; Deng, Qiling2; Dong, Xiaochun2; Du, Chunlei2
刊名: APPLIED OPTICS
出版日期: 2011-05-01
卷号: 50, 期号:13, 页码:1963-1967
文章类型: Article
英文摘要: We have recently shown that patterns with 30 nm line width and micrometer scale periodicity could be steadily fabricated by employing localized surface plasmons lithography based on a soft mold [Opt. Lett. 35, 13 (2009)]. In this paper, the dependence of the resolution (pattern periodicity), critical dimension, and electric field intensity on the geometrical parameters of the soft mold, such as ridge width, mold periodicity, ridge depth, and slope, have been systematically studied and analyzed. The relevant simulation results by finite-difference time-domain demonstrate that the critical dimension exhibits a perfect stabilization and the value of electric field intensity would be especially large, when the ridge depth is in the range from 100 to 270 nm and the slope angle is below 35 degrees. Importantly, the optimal resolution and critical dimension can reach 100 and 17 nm, respectively, by reasonably designing the corresponding mold periodicity and ridge width, which indicates that the method is particularly suitable for obtaining patterns with high density and is extremely promising for bio-sensing and photonic crystals application. (C) 2011 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: ELECTRON-BEAM LITHOGRAPHY ; ACHROMATIC INTERFEROMETRIC LITHOGRAPHY ; NANOLITHOGRAPHY ; GRATINGS ; GRIDS ; METAL
收录类别: SCI
语种: 英语
WOS记录号: WOS:000290018700027
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3465
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Sichuan Univ, Dept Phys, Chengdu 610064, Sichuan Prov, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan Prov, Peoples R China

Recommended Citation:
Zhang, Yukun,Du, Jinglei,Wei, Xingzhan,et al. Resolution and stability analysis of localized surface plasmon lithography on the geometrical parameters of soft mold[J]. APPLIED OPTICS,2011,50(13):1963-1967.
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