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题名:
Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography
作者: Jiang, Wenbo1,2; Hu, Song3; Xie, Changqing4; Zhu, Xiaoli4; Zhao, Lixin3; Xie, Weicheng1,2; Wang, Jun1,2; Dong, Xiucheng1,2
刊名: MICROELECTRONIC ENGINEERING
出版日期: 2011-10-01
卷号: 88, 期号:10, 页码:3178-3181
关键词: Submicron photon sieve ; E-beam lithography ; X-ray lithography ; Key technique ; Error analysis
文章类型: Article
英文摘要: In this paper, a new hybrid method to fabricate submicron photon sieve is proposed, where the E-beam lithography and the X-ray lithography are used. It is found that 2.81 mu m thickness of the polyimide film, 400 nm thickness of the ZEP-520 and 280 mu C/cm(2) exposure dose are good for E-beam lithography, while 500 nm thickness of the PMMA and 30 s developing time are good for X-ray lithography. We have successfully fabricated the photon sieve with these parameters (the diameter of photon sieve: 250 mu m, the focal length: 150 mu m, the diameter of the outmost pinhole: 420 nm). Some key techniques of this method are analyzed respectively, and the error analysis are done at the end of this paper. It provides a direction of nanoscale optical element fabrication with higher resolution and lower cost. (C) 2011 Elsevier B.V. All rights reserved.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Science & Technology - Other Topics ; Optics ; Physics
关键词[WOS]: MODEL
收录类别: SCI
语种: 英语
WOS记录号: WOS:000297400900025
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3457
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Xihua Univ, Sch Elect & Informat Engn, Chengdu 610039, Peoples R China
2.Xihua Univ, Key Lab Signal & Informat Proc Sichuan Prov, Chengdu 610039, Peoples R China
3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
4.Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China

Recommended Citation:
Jiang, Wenbo,Hu, Song,Xie, Changqing,et al. Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography[J]. MICROELECTRONIC ENGINEERING,2011,88(10):3178-3181.
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