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Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography
Jiang, Wenbo1,2; Hu, Song3; Xie, Changqing4; Zhu, Xiaoli4; Zhao, Lixin3; Xie, Weicheng1,2; Wang, Jun1,2; Dong, Xiucheng1,2
Source PublicationMICROELECTRONIC ENGINEERING
Volume88Issue:10Pages:3178-3181
2011-10-01
Language英语
Indexed BySCI
WOS IDWOS:000297400900025
SubtypeArticle
AbstractIn this paper, a new hybrid method to fabricate submicron photon sieve is proposed, where the E-beam lithography and the X-ray lithography are used. It is found that 2.81 mu m thickness of the polyimide film, 400 nm thickness of the ZEP-520 and 280 mu C/cm(2) exposure dose are good for E-beam lithography, while 500 nm thickness of the PMMA and 30 s developing time are good for X-ray lithography. We have successfully fabricated the photon sieve with these parameters (the diameter of photon sieve: 250 mu m, the focal length: 150 mu m, the diameter of the outmost pinhole: 420 nm). Some key techniques of this method are analyzed respectively, and the error analysis are done at the end of this paper. It provides a direction of nanoscale optical element fabrication with higher resolution and lower cost. (C) 2011 Elsevier B.V. All rights reserved.
KeywordSubmicron Photon Sieve E-beam Lithography X-ray Lithography Key Technique Error Analysis
WOS KeywordMODEL
WOS Research AreaEngineering ; Science & Technology - Other Topics ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
Citation statistics
Cited Times:8[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3457
Collection光电技术研究所被WoS收录文章
Affiliation1.Xihua Univ, Sch Elect & Informat Engn, Chengdu 610039, Peoples R China
2.Xihua Univ, Key Lab Signal & Informat Proc Sichuan Prov, Chengdu 610039, Peoples R China
3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
4.Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Recommended Citation
GB/T 7714
Jiang, Wenbo,Hu, Song,Xie, Changqing,et al. Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography[J]. MICROELECTRONIC ENGINEERING,2011,88(10):3178-3181.
APA Jiang, Wenbo.,Hu, Song.,Xie, Changqing.,Zhu, Xiaoli.,Zhao, Lixin.,...&Dong, Xiucheng.(2011).Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography.MICROELECTRONIC ENGINEERING,88(10),3178-3181.
MLA Jiang, Wenbo,et al."Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography".MICROELECTRONIC ENGINEERING 88.10(2011):3178-3181.
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