Knowledge Management System Of Institute of optics and electronics, CAS
| Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography | |
| Jiang, Wenbo1,2; Hu, Song3; Xie, Changqing4; Zhu, Xiaoli4; Zhao, Lixin3; Xie, Weicheng1,2; Wang, Jun1,2; Dong, Xiucheng1,2 | |
| Source Publication | MICROELECTRONIC ENGINEERING
 |
| Volume | 88Issue:10Pages:3178-3181 |
| 2011-10-01 | |
| Language | 英语 |
| Indexed By | SCI |
| WOS ID | WOS:000297400900025 |
| Subtype | Article |
| Abstract | In this paper, a new hybrid method to fabricate submicron photon sieve is proposed, where the E-beam lithography and the X-ray lithography are used. It is found that 2.81 mu m thickness of the polyimide film, 400 nm thickness of the ZEP-520 and 280 mu C/cm(2) exposure dose are good for E-beam lithography, while 500 nm thickness of the PMMA and 30 s developing time are good for X-ray lithography. We have successfully fabricated the photon sieve with these parameters (the diameter of photon sieve: 250 mu m, the focal length: 150 mu m, the diameter of the outmost pinhole: 420 nm). Some key techniques of this method are analyzed respectively, and the error analysis are done at the end of this paper. It provides a direction of nanoscale optical element fabrication with higher resolution and lower cost. (C) 2011 Elsevier B.V. All rights reserved. |
| Keyword | Submicron Photon Sieve E-beam Lithography X-ray Lithography Key Technique Error Analysis |
| WOS Keyword | MODEL |
| WOS Research Area | Engineering ; Science & Technology - Other Topics ; Optics ; Physics |
| WOS Subject | Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ioe.ac.cn/handle/181551/3457 |
| Collection | 光电技术研究所被WoS收录文章 |
| Affiliation | 1.Xihua Univ, Sch Elect & Informat Engn, Chengdu 610039, Peoples R China 2.Xihua Univ, Key Lab Signal & Informat Proc Sichuan Prov, Chengdu 610039, Peoples R China 3.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 4.Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China |
| Recommended Citation GB/T 7714 | Jiang, Wenbo,Hu, Song,Xie, Changqing,et al. Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography[J]. MICROELECTRONIC ENGINEERING,2011,88(10):3178-3181. |
| APA | Jiang, Wenbo.,Hu, Song.,Xie, Changqing.,Zhu, Xiaoli.,Zhao, Lixin.,...&Dong, Xiucheng.(2011).Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography.MICROELECTRONIC ENGINEERING,88(10),3178-3181. |
| MLA | Jiang, Wenbo,et al."Fabrication of submicron photon sieve using E-beam lithography and X-ray lithography".MICROELECTRONIC ENGINEERING 88.10(2011):3178-3181. |
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