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Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform
Xu, Feng1; Song, Hu; Zhou, Shaolin
Source PublicationOPTICAL ENGINEERING
Volume50Issue:8
2011-08-01
Language英语
Indexed BySCI
WOS IDWOS:000294306500050
SubtypeArticle
AbstractA simple but effective phase analysis method for the fringe pattern that occurs in two superposed grating marks applied in the previously designed dual-grating-based alignment scheme for lithography is proposed. First, the fringe pattern is processed and analyzed using a frequency domain method based on two-dimensional (2D) Fourier transform, and the 2D notch filter is appropriately designed to select the useful spectrum to obtain the target phase information. Further, phase difference of two sets of fringes is computed to acquire the alignment offset. Numerical simulation and experiment are both performed to verify this method. Finally, certain analysis about the error of phase difference extraction in the fringe pattern and precision of alignment are also presented. The results indicate that the background and noise of the fringe pattern can be efficiently filtered and target phase information can be extracted with high accuracy through this method. (C) 2011 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.3609007]
KeywordNanolithography Alignment Fringe Pattern Analysis Two-dimensional Fourier Transform Phase Extraction
WOS KeywordX-RAY-LITHOGRAPHY ; MOIRE FRINGE ; SYSTEM
WOS Research AreaOptics
WOS SubjectOptics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3442
Collection光电技术研究所被WoS收录文章
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
Recommended Citation
GB/T 7714
Xu, Feng,Song, Hu,Zhou, Shaolin. Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform[J]. OPTICAL ENGINEERING,2011,50(8).
APA Xu, Feng,Song, Hu,&Zhou, Shaolin.(2011).Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform.OPTICAL ENGINEERING,50(8).
MLA Xu, Feng,et al."Fringe pattern analysis for optical alignment in nanolithography using two-dimentional Fourier transform".OPTICAL ENGINEERING 50.8(2011).
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