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题名:
Improving resolution of superlens lithography by phase-shifting mask
作者: Yao, Na; Lai, Zian; Fang, Liang; Wang, Changtao; Feng, Qin; Zhao, Zheyu; Luo, Xiangang
刊名: OPTICS EXPRESS
出版日期: 2011-08-15
卷号: 19, 期号:17, 页码:15982-15989
文章类型: Article
英文摘要: We propose to apply phase-shifting mask (PSM) to superlens lithography to improve its resolution. The PSM comprises of chromium slits alternatively filled by Ag and PMMA. The pi-phase shift is induced whereas their transmittance of electric intensity is almost equal for two neighboring slits. The destructive interference between two slits has greatly improved the spatial resolution and image fidelity. For representative configurations of superlens lithography, FDTD numerical simulations demonstrate that two slits with center-to-center distance d = 35 nm (similar to lambda/10) can be resolved in PSM design, compared to 60 nm (similar to lambda/6) without the PSM. (C)2011 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: SILVER SUPERLENS ; NEAR-FIELD ; DESIGN ; SLAB
收录类别: SCI
语种: 英语
WOS记录号: WOS:000293894900036
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3435
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Yao, Na,Lai, Zian,Fang, Liang,et al. Improving resolution of superlens lithography by phase-shifting mask[J]. OPTICS EXPRESS,2011,19(17):15982-15989.
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