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Improving resolution of superlens lithography by phase-shifting mask
Yao, Na; Lai, Zian; Fang, Liang; Wang, Changtao; Feng, Qin; Zhao, Zheyu; Luo, Xiangang
Source PublicationOPTICS EXPRESS
Volume19Issue:17Pages:15982-15989
2011-08-15
Language英语
Indexed BySCI
WOS IDWOS:000293894900036
SubtypeArticle
AbstractWe propose to apply phase-shifting mask (PSM) to superlens lithography to improve its resolution. The PSM comprises of chromium slits alternatively filled by Ag and PMMA. The pi-phase shift is induced whereas their transmittance of electric intensity is almost equal for two neighboring slits. The destructive interference between two slits has greatly improved the spatial resolution and image fidelity. For representative configurations of superlens lithography, FDTD numerical simulations demonstrate that two slits with center-to-center distance d = 35 nm (similar to lambda/10) can be resolved in PSM design, compared to 60 nm (similar to lambda/6) without the PSM. (C)2011 Optical Society of America
WOS KeywordSILVER SUPERLENS ; NEAR-FIELD ; DESIGN ; SLAB
WOS Research AreaOptics
WOS SubjectOptics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3435
Collection光电技术研究所被WoS收录文章
AffiliationChinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Yao, Na,Lai, Zian,Fang, Liang,et al. Improving resolution of superlens lithography by phase-shifting mask[J]. OPTICS EXPRESS,2011,19(17):15982-15989.
APA Yao, Na.,Lai, Zian.,Fang, Liang.,Wang, Changtao.,Feng, Qin.,...&Luo, Xiangang.(2011).Improving resolution of superlens lithography by phase-shifting mask.OPTICS EXPRESS,19(17),15982-15989.
MLA Yao, Na,et al."Improving resolution of superlens lithography by phase-shifting mask".OPTICS EXPRESS 19.17(2011):15982-15989.
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