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题名:
Nano-photomask fabrication using focused ion beam direct writing
作者: Fang, F. Z.1,2; Xu, Z. W.1,2; Hu, X. T.1; Wang, C. T.3; Luo, X. G.3; Fu, Y. Q.4
刊名: CIRP ANNALS-MANUFACTURING TECHNOLOGY
出版日期: 2010
卷号: 59, 期号:1, 页码:543-546
关键词: Ion beam machining (IBM) ; Nano-manufacturing ; Photomask
文章类型: Article
英文摘要: A novel nano-photomask fabrication method using focused ion beam direct writing (FIBDW) is proposed to normalize the dwell time of each pixel of the ion beam location with respect to the contrast of designed bitmaps. The removal mechanism is studied to develop the fabrication process. It has been confirmed that beam dwell time, astigmation and overlap are the most effective parameters for achieving the features in nanoscale. An approach for dot array milling is proposed also for inspecting and correcting the beam astigmatism. Photomasks with line width of 32 nm are employed for the purpose of successful application of this novel method in this study. (C) 2010 CIRP.
WOS标题词: Science & Technology ; Technology
类目[WOS]: Engineering, Industrial ; Engineering, Manufacturing
研究领域[WOS]: Engineering
关键词[WOS]: TECHNOLOGY
收录类别: SCI ; ISTP
语种: 英语
WOS记录号: WOS:000280115100131
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3404
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Tianjin Univ, State Key Lab Precis Measuring Technol & Instrume, Ctr MicroNano Mfg Technol, Tianjin 300072, Peoples R China
2.Tianjin MicroNano Mfg Tech Co Ltd, Tianjin, Peoples R China
3.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Beijing 100864, Peoples R China
4.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China

Recommended Citation:
Fang, F. Z.,Xu, Z. W.,Hu, X. T.,et al. Nano-photomask fabrication using focused ion beam direct writing[J]. CIRP ANNALS-MANUFACTURING TECHNOLOGY,2010,59(1):543-546.
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