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Nano-photomask fabrication using focused ion beam direct writing
Fang, F. Z.1,2; Xu, Z. W.1,2; Hu, X. T.1; Wang, C. T.3; Luo, X. G.3; Fu, Y. Q.4
Source PublicationCIRP ANNALS-MANUFACTURING TECHNOLOGY
Volume59Issue:1Pages:543-546
2010
Language英语
Indexed BySCI ; ISTP
WOS IDWOS:000280115100131
SubtypeArticle
AbstractA novel nano-photomask fabrication method using focused ion beam direct writing (FIBDW) is proposed to normalize the dwell time of each pixel of the ion beam location with respect to the contrast of designed bitmaps. The removal mechanism is studied to develop the fabrication process. It has been confirmed that beam dwell time, astigmation and overlap are the most effective parameters for achieving the features in nanoscale. An approach for dot array milling is proposed also for inspecting and correcting the beam astigmatism. Photomasks with line width of 32 nm are employed for the purpose of successful application of this novel method in this study. (C) 2010 CIRP.
KeywordIon Beam Machining (Ibm) Nano-manufacturing Photomask
WOS KeywordTECHNOLOGY
WOS Research AreaEngineering
WOS SubjectEngineering, Industrial ; Engineering, Manufacturing
Citation statistics
Cited Times:11[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3404
Collection光电技术研究所被WoS收录文章
Affiliation1.Tianjin Univ, State Key Lab Precis Measuring Technol & Instrume, Ctr MicroNano Mfg Technol, Tianjin 300072, Peoples R China
2.Tianjin MicroNano Mfg Tech Co Ltd, Tianjin, Peoples R China
3.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Beijing 100864, Peoples R China
4.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China
Recommended Citation
GB/T 7714
Fang, F. Z.,Xu, Z. W.,Hu, X. T.,et al. Nano-photomask fabrication using focused ion beam direct writing[J]. CIRP ANNALS-MANUFACTURING TECHNOLOGY,2010,59(1):543-546.
APA Fang, F. Z.,Xu, Z. W.,Hu, X. T.,Wang, C. T.,Luo, X. G.,&Fu, Y. Q..(2010).Nano-photomask fabrication using focused ion beam direct writing.CIRP ANNALS-MANUFACTURING TECHNOLOGY,59(1),543-546.
MLA Fang, F. Z.,et al."Nano-photomask fabrication using focused ion beam direct writing".CIRP ANNALS-MANUFACTURING TECHNOLOGY 59.1(2010):543-546.
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