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题名:
Moire-based focusing and leveling scheme for optical projection lithography
作者: Yan, Wei1; Yang, Yong1; Chen, Wangfu1,2; Hu, Song1; Zhou, Shaolin1,2
刊名: APPLIED OPTICS
出版日期: 2010-11-01
卷号: 49, 期号:31, 页码:5959-5963
文章类型: Article
英文摘要: During the process of integrated circuit manufacturing, positioning techniques, such as leveling and focusing, are among the key factors in improving the resolution of optical lithography and related lithographic tools. We present a measurement scheme based on the proverbial moire effect for focus positioning in projection lithography. The framework of this scheme is based on a fundamental model of dual gratings and can also be decomposed into a dual 4f optical system. In this scheme, the moire effect that usually occurs in the superposition of two gratings also comes forth when they are located at two sides of the dual 4f optical system, which puts one grating together with the other by optical imaging. Related results of this basic dual-grating model have been concluded. The framework of this scheme is built, and the complex structure is explored when similarly broken down to a basic model of two superposed proximity gratings. Finally, experimental results and corresponding analyses indicate that focusing resolution at the nanometer level can be realized by this scheme. (C) 2010 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: WAFER STEPPERS ; ALIGNMENT ; INTERFEROMETRY
收录类别: SCI
语种: 英语
WOS记录号: WOS:000283653000024
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3374
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China

Recommended Citation:
Yan, Wei,Yang, Yong,Chen, Wangfu,et al. Moire-based focusing and leveling scheme for optical projection lithography[J]. APPLIED OPTICS,2010,49(31):5959-5963.
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