We propose a photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film. The soft mold can be formed by transparent materials, such as polydimethylsiloxane, contacting firmly to the metal film. The pattern edges of the mold, serving as the fine tapers, can be used to excite LSPs and accumulate a large amount of localized energy from the incident light field, providing a modulated optical field in the resist with nanometer feature size. Nanolithographic results with a minimum feature size of 30 nm are demonstrated. (C) 2010 Optical Society of America
1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China 2.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
Zhang, Yukun,Dong, Xiaochun,Du, Jinglei,et al. Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film[J]. OPTICS LETTERS,2010,35(13):2143-2145.