IOE OpenIR  > 光电技术研究所被WoS收录文章
Multilayer pattern transfer for plasmonic color filter applications
Kaplan, Alex F.1; Xu, Ting1,2; Wu, Yi-Kuei1; Guo, L. Jay1
Source PublicationJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume28Issue:6Pages:C6O60-C6O63
2010-11-01
Language英语
Indexed BySCI ; ISTP
WOS IDWOS:000285015200102
SubtypeArticle
AbstractContact printing involves transferring a material deposited on a prepatterned mold directly to a substrate with the application of uniform pressure and temperature. This process has traditionally been used to transfer metal layers to act as electrodes or masks for subsequent etch steps. In this work, the authors propose that devices with multiple layers, such as metal-insulator-metal (MIM) structures, can be transferred over using similar processing techniques. Using a SiO2 grating mold, the authors demonstrate the transfer of a MIM pattern to a flexible polycarbonate substrate in order to create a thin film, reflective color filter. This method could be optimized for roll-to-roll nanoimprint lithography and could be used to efficiently fabricate large-area structures on various substrates for display applications. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3511430]
WOS KeywordSELF-ASSEMBLED MONOLAYERS ; METAL ; LITHOGRAPHY ; SILICON
WOS Research AreaEngineering ; Science & Technology - Other Topics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Physics, Applied
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3357
Collection光电技术研究所被WoS收录文章
Affiliation1.Univ Michigan, Dept Elect Engn & Comp Sci, Ctr Nanophoton & Spintron, Ann Arbor, MI 48109 USA
2.Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu, Peoples R China
Recommended Citation
GB/T 7714
Kaplan, Alex F.,Xu, Ting,Wu, Yi-Kuei,et al. Multilayer pattern transfer for plasmonic color filter applications[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2010,28(6):C6O60-C6O63.
APA Kaplan, Alex F.,Xu, Ting,Wu, Yi-Kuei,&Guo, L. Jay.(2010).Multilayer pattern transfer for plasmonic color filter applications.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,28(6),C6O60-C6O63.
MLA Kaplan, Alex F.,et al."Multilayer pattern transfer for plasmonic color filter applications".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 28.6(2010):C6O60-C6O63.
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