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题名:
Multilayer pattern transfer for plasmonic color filter applications
作者: Kaplan, Alex F.1; Xu, Ting1,2; Wu, Yi-Kuei1; Guo, L. Jay1
刊名: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
出版日期: 2010-11-01
卷号: 28, 期号:6, 页码:C6O60-C6O63
文章类型: Article
英文摘要: Contact printing involves transferring a material deposited on a prepatterned mold directly to a substrate with the application of uniform pressure and temperature. This process has traditionally been used to transfer metal layers to act as electrodes or masks for subsequent etch steps. In this work, the authors propose that devices with multiple layers, such as metal-insulator-metal (MIM) structures, can be transferred over using similar processing techniques. Using a SiO2 grating mold, the authors demonstrate the transfer of a MIM pattern to a flexible polycarbonate substrate in order to create a thin film, reflective color filter. This method could be optimized for roll-to-roll nanoimprint lithography and could be used to efficiently fabricate large-area structures on various substrates for display applications. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3511430]
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Physics, Applied
研究领域[WOS]: Engineering ; Science & Technology - Other Topics ; Physics
关键词[WOS]: SELF-ASSEMBLED MONOLAYERS ; METAL ; LITHOGRAPHY ; SILICON
收录类别: SCI ; ISTP
语种: 英语
WOS记录号: WOS:000285015200102
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3357
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Univ Michigan, Dept Elect Engn & Comp Sci, Ctr Nanophoton & Spintron, Ann Arbor, MI 48109 USA
2.Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu, Peoples R China

Recommended Citation:
Kaplan, Alex F.,Xu, Ting,Wu, Yi-Kuei,et al. Multilayer pattern transfer for plasmonic color filter applications[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,2010,28(6):C6O60-C6O63.
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