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题名:
A quick algorithm of exposure distribution for fabrication of micro-optical structures
作者: Li, Shuhong2; Du, Chunlei2; Fu, Yongqi1
刊名: OPTIK
出版日期: 2010
卷号: 121, 期号:11, 页码:988-992
关键词: Microstructure fabrication ; Lenses ; Microlithography
文章类型: Article
英文摘要: An approximate algorithm of exposure distribution on photoresist for the case of large exposure dose is obtained on the basis of the algorithm reported in [X. Dong, C. Du, S. Li, C. Wang, Y. Fu, Control approach for form accuracy of microlenses with continuous relief, Opt. Express 13 (2005) 1353-1360] via analyzing a PAC concentration distribution inside the photoresist. We analyzed the fabrication errors of the micro-optical structures which are caused by the approximate algorithm. The relief form error originating from the measurement errors of characteristics parameters of the photoresist is analyzed as well. A valid approach for a quick and accurate design of the exposure distribution is provided accordingly. As an example, a saw-tooth grating with 75 mu m relief depth was designed and fabricated so as to verify the new algorithm. Our measurement results show that root mean square (rms) value is less than 0.81 mu m. The quick algorithm can satisfy the requirements of micro-optical systems for practical applications. (C) 2009 Elsevier GmbH. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: PHOTORESIST DISSOLUTION ; LITHOGRAPHY SIMULATION ; PARAMETER MEASUREMENTS ; MODEL
收录类别: SCI
语种: 英语
WOS记录号: WOS:000279003000006
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3355
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Sichuan, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 10209, Sichuan, Peoples R China

Recommended Citation:
Li, Shuhong,Du, Chunlei,Fu, Yongqi. A quick algorithm of exposure distribution for fabrication of micro-optical structures[J]. OPTIK,2010,121(11):988-992.
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