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A quick algorithm of exposure distribution for fabrication of micro-optical structures
Li, Shuhong2; Du, Chunlei2; Fu, Yongqi1
Source PublicationOPTIK
Volume121Issue:11Pages:988-992
2010
Language英语
Indexed BySCI
WOS IDWOS:000279003000006
SubtypeArticle
AbstractAn approximate algorithm of exposure distribution on photoresist for the case of large exposure dose is obtained on the basis of the algorithm reported in [X. Dong, C. Du, S. Li, C. Wang, Y. Fu, Control approach for form accuracy of microlenses with continuous relief, Opt. Express 13 (2005) 1353-1360] via analyzing a PAC concentration distribution inside the photoresist. We analyzed the fabrication errors of the micro-optical structures which are caused by the approximate algorithm. The relief form error originating from the measurement errors of characteristics parameters of the photoresist is analyzed as well. A valid approach for a quick and accurate design of the exposure distribution is provided accordingly. As an example, a saw-tooth grating with 75 mu m relief depth was designed and fabricated so as to verify the new algorithm. Our measurement results show that root mean square (rms) value is less than 0.81 mu m. The quick algorithm can satisfy the requirements of micro-optical systems for practical applications. (C) 2009 Elsevier GmbH. All rights reserved.
KeywordMicrostructure Fabrication Lenses Microlithography
WOS KeywordPHOTORESIST DISSOLUTION ; LITHOGRAPHY SIMULATION ; PARAMETER MEASUREMENTS ; MODEL
WOS Research AreaOptics
WOS SubjectOptics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3355
Collection光电技术研究所被WoS收录文章
Affiliation1.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Sichuan, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 10209, Sichuan, Peoples R China
Recommended Citation
GB/T 7714
Li, Shuhong,Du, Chunlei,Fu, Yongqi. A quick algorithm of exposure distribution for fabrication of micro-optical structures[J]. OPTIK,2010,121(11):988-992.
APA Li, Shuhong,Du, Chunlei,&Fu, Yongqi.(2010).A quick algorithm of exposure distribution for fabrication of micro-optical structures.OPTIK,121(11),988-992.
MLA Li, Shuhong,et al."A quick algorithm of exposure distribution for fabrication of micro-optical structures".OPTIK 121.11(2010):988-992.
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