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Extended dual-grating alignment method for optical projection lithography
Chen, Wangfu1,2; Yan, Wei1,2; Hu, Song1; Yang, Yong1; Zhou, Shaolin1,2
Source PublicationAPPLIED OPTICS
Volume49Issue:4Pages:708-713
2010-02-01
Language英语
Indexed BySCI
WOS IDWOS:000274443600024
SubtypeArticle
AbstractSince accurate alignment is essential for projection lithography, an extended dual-grating based alignment scheme is proposed. This method is an extension of the basic dual-grating alignment model, the mechanism of which is explained to make it clear how the extended scheme performs in projection lithography. The framework of the extended alignment scheme for projection lithography is constructed, and the process of key parameter determination is then detailed. In both cases, a tiny shift of the wafer during the alignment process can be resolved by a conspicuous displacement or phase variation of corresponding fringes. Analytical results indicate that alignment is independent of the gap between wafer and mask, disturbance from the fluctuation in illumination can be neglected, and alignment resolution in subnanometers can be realized with this scheme. (C) 2010 Optical Society of America
WOS KeywordX-RAY-LITHOGRAPHY ; NANOIMPRINT LITHOGRAPHY ; MOIRE FRINGE ; SYSTEM
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Cited Times:12[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3351
Collection光电技术研究所被WoS收录文章
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
Recommended Citation
GB/T 7714
Chen, Wangfu,Yan, Wei,Hu, Song,et al. Extended dual-grating alignment method for optical projection lithography[J]. APPLIED OPTICS,2010,49(4):708-713.
APA Chen, Wangfu,Yan, Wei,Hu, Song,Yang, Yong,&Zhou, Shaolin.(2010).Extended dual-grating alignment method for optical projection lithography.APPLIED OPTICS,49(4),708-713.
MLA Chen, Wangfu,et al."Extended dual-grating alignment method for optical projection lithography".APPLIED OPTICS 49.4(2010):708-713.
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