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题名:
Design and application of phase photon sieve
作者: Jiang, Wenbo1,2; Hu, Song1; Zhao, Lixin1; Yan, Wei1; Yang, Yong1,2
刊名: OPTIK
出版日期: 2010
卷号: 121, 期号:7, 页码:637-640
关键词: Imaging principle ; Phase photon sieve ; Design and fabrication ; Nano-lithography experiment system
文章类型: Article
英文摘要: The imaging principle of Fresnel zone plate and photon sieve were analyzed in this paper. The design and fabrication of phase photon sieve were discussed. The feasibility of using phase photon sieve to realize nano-lithography was analyzed, a novel lithography experiment system based on phase photon sieve was presented, which not only has higher resolution and image contrast than the Fresnel zone plate lithography but also have higher diffractive efficiency than the amplitude photon sieve lithography. (C) 2009 Elsevier GmbH. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: FRACTAL ZONE PLATES ; LITHOGRAPHY
收录类别: SCI
语种: 英语
WOS记录号: WOS:000276613200009
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3348
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China

Recommended Citation:
Jiang, Wenbo,Hu, Song,Zhao, Lixin,et al. Design and application of phase photon sieve[J]. OPTIK,2010,121(7):637-640.
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