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题名:
A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique
作者: He, Mingyang1,2; Zhang, Zhiyou1,2; Shi, Sha1,2; Du, Jinglei1,2; Li, Xupeng1,2; Li, Shuhong1,2; Ma, Wenying3
刊名: OPTICS EXPRESS
出版日期: 2010-07-19
卷号: 18, 期号:15, 页码:15975-15980
文章类型: Article
英文摘要: For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside-exposure method are studied and the interference fringes with feature size below 65nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid. (C) 2010 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: SOLID IMMERSION LENS ; EVANESCENT WAVES ; ASSISTED NANOLITHOGRAPHY ; BEAM LITHOGRAPHY ; FEATURES
收录类别: SCI
语种: 英语
WOS记录号: WOS:000280693300077
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3343
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Sichuan Univ, Inst Nanophoton Technol, Sch Phys Sci & Technol, Chengdu 610064, Peoples R China
2.Sichuan Univ, Key Lab High Energy Dens Phys, Educ Minist, Sch Phys Sci & Technol, Chengdu 610064, Peoples R China
3.Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
He, Mingyang,Zhang, Zhiyou,Shi, Sha,et al. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique[J]. OPTICS EXPRESS,2010,18(15):15975-15980.
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