For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside-exposure method are studied and the interference fringes with feature size below 65nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid. (C) 2010 Optical Society of America
1.Sichuan Univ, Inst Nanophoton Technol, Sch Phys Sci & Technol, Chengdu 610064, Peoples R China 2.Sichuan Univ, Key Lab High Energy Dens Phys, Educ Minist, Sch Phys Sci & Technol, Chengdu 610064, Peoples R China 3.Inst Opt & Elect, Chengdu 610209, Peoples R China
He, Mingyang,Zhang, Zhiyou,Shi, Sha,et al. A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique[J]. OPTICS EXPRESS,2010,18(15):15975-15980.