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题名:
Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography
作者: Zhou, Shaolin1,2; Yang, Yong1; Zhao, Lixin1; Hu, Song1
刊名: OPTICS LETTERS
出版日期: 2010-09-15
卷号: 35, 期号:18, 页码:3132-3134
文章类型: Article
英文摘要: We demonstrate a tilt-modulated phase imaging method to adjust the gap inconsistency for wafer-mask leveling in proximity lithography. Two gratings with close periods are etched on the mask and used as leveling marks. At the illumination of a monochromatic planar wave, the diffracted image of one grating is projected back onto the other one beside it through reflection at the wafer surface. Any wafer-mask tilts in two orthogonal sections are directly modulated into the phase distribution of the interference field and can be directly remedied according to the frequency and angle deviation of the two sets of fringes. Finally, wafer-mask leveling can be achieved at only one spot with preserved accuracy. Computational and experimental results confirm that tilts at the magnitude of 10(-3) rad can be readily resolved by this method. (C) 2010 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: STEPPERS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000281994500045
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3341
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China

Recommended Citation:
Zhou, Shaolin,Yang, Yong,Zhao, Lixin,et al. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography[J]. OPTICS LETTERS,2010,35(18):3132-3134.
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