IOE OpenIR  > 光电技术研究所被WoS收录文章
Material removal model of vertical impinging in fluid jet polishing
Shi, Chunyan; Yuan, Jiahu; Wu, Fan; Hou, Xi; Wan, Yongjian
Source PublicationCHINESE OPTICS LETTERS
Volume8Issue:3Pages:323-325
2010-03-10
Language英语
Indexed BySCI
WOS IDWOS:000275821700021
SubtypeArticle
AbstractIt. Is important. for precise fabrication to research the material removal model of polishing Simulation is done by computational fluid dynamics for fluid jet polishing (FJP) Numerical research and theoretical description for abrasive particles discrete system are taken by population balance modeling method, and experiments are taken to research the removal profile by vertical fluid Jet polishing (VRJP) The results of experiment and simulation show that die removal profile of VFJP turns on a W-shaped profile By analyzing the material removal mechanism of FJP that, material is removed by particles impinging weal and wall movement, erosion, the mathematical material removal model of VFJP is end iced Compating, the mathematical material removal model with the experimental removal profile, a is found that, the mathematical material removal model of VFJP is accurate.
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Cited Times:8[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3326
Collection光电技术研究所被WoS收录文章
AffiliationChinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Shi, Chunyan,Yuan, Jiahu,Wu, Fan,et al. Material removal model of vertical impinging in fluid jet polishing[J]. CHINESE OPTICS LETTERS,2010,8(3):323-325.
APA Shi, Chunyan,Yuan, Jiahu,Wu, Fan,Hou, Xi,&Wan, Yongjian.(2010).Material removal model of vertical impinging in fluid jet polishing.CHINESE OPTICS LETTERS,8(3),323-325.
MLA Shi, Chunyan,et al."Material removal model of vertical impinging in fluid jet polishing".CHINESE OPTICS LETTERS 8.3(2010):323-325.
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