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题名:
Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure
作者: Yang, Xuefeng; Fang, Liang; Zeng, Beibei; Wang, Changtao; Feng, Qin; Luo, Xiangang
刊名: JOURNAL OF OPTICS
出版日期: 2010-04-01
卷号: 12, 期号:4
关键词: surface plasmons ; photolithography ; interference ; optical waveguides
文章类型: Article
英文摘要: Deep subwavelength photolithography with a metallic grating waveguide heterostructure (MGWHS) is presented and numerically demonstrated by a finite-difference time-domain method. This lithography scheme is demonstrated by interference between the diffracted waves of the mask which are enhanced by the surface plasmon polariton (SPP) resonance in this MGWHS. The relationship between the pattern resolution and the thickness of the photoresist is discussed. With proper choices of the dimensions of the proposed MGWHS and the illumination light, either a deep subwavelength (similar to lambda/17) pattern with sufficient contrast or a high quality interference pattern can be achieved. This approach is suitable for application to deep subwavelength photolithography without expensive equipment.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: INTERFERENCE NANOLITHOGRAPHY ; LITHOGRAPHY ; LAYER ; LENS ; NM
收录类别: SCI
语种: 英语
WOS记录号: WOS:000279943300002
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3325
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Yang, Xuefeng,Fang, Liang,Zeng, Beibei,et al. Deep subwavelength photolithography based on surface plasmon polariton resonance with metallic grating waveguide heterostructure[J]. JOURNAL OF OPTICS,2010,12(4).
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