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题名:
Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System
作者: Jiang, Wenbo1,2; Hu, Song1; Zhao, Lixin1; Yan, Wei1; Yang, Yong1,2; Zhou, Shaolin1,2; Chen, Wangfu1,2
刊名: JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE
出版日期: 2009-05-01
卷号: 6, 期号:5, 页码:1170-1174
关键词: Maskless Lithography ; Key Techniques ; Lithographic Experiment ; Nanoscale
文章类型: Article
英文摘要: In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
WOS标题词: Science & Technology ; Physical Sciences ; Technology
类目[WOS]: Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
研究领域[WOS]: Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
关键词[WOS]: ELECTRON-BEAM LITHOGRAPHY ; PHOTON-SIEVE
收录类别: SCI
语种: 英语
WOS记录号: WOS:000265745000031
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3283
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China

Recommended Citation:
Jiang, Wenbo,Hu, Song,Zhao, Lixin,et al. Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System[J]. JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE,2009,6(5):1170-1174.
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