In this paper, we present a novel optical maskless lithographic system. Compared with conventional optical maskless lithographic system, there are three key techniques in our system. They are illuminating system, focusing system, precise position work-stage system. We introduce and analyze three systems in this paper respectively. Through theoretic analysis and optical lithographic experiment, the results show that it provides a direction of optical lithographic technology with higher resolution and lower cost. By proper design the structure of the whole system and melioration on diffractive element, better resolution can be realized. It will be used to fabricate the nanoscale line width in the near future after further meliorations.
1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China 2.Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
Jiang, Wenbo,Hu, Song,Zhao, Lixin,et al. Fabrication of Nanoscale Line Width Using the Improved Optical Maskless Lithographic System[J]. JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE,2009,6(5):1170-1174.