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题名:
Improved near field lithography by surface plasmon resonance in groove-patterned masks
作者: Zeng, Beibei; Pan, Li; Liu, Ling; Fang, Liang; Wang, Changtao; Luo, Xiangang
刊名: JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS
出版日期: 2009-12-01
卷号: 11, 期号:12
关键词: surface plasmon ; optical lithography
文章类型: Article
英文摘要: Near field lithography (NFL) provides an effective way for obtaining lithography features' sizes far beyond the diffraction limit. However, optical transmission through isolated subwavelength apertures is very low in the lithography process. It also makes it difficult to obtain a uniform lithography pattern where isolated and arrayed slit structures coexist because of different optical transmission through these two kinds of structures. It is proposed in this paper that using appropriately designed groove structures around subwavelength metallic slits could solve this problem. Numerical calculations performed by the finite-difference time-domain (FDTD) method demonstrate that about ten times transmission enhancement could be obtained. This occurs as a surface plasmon is resonantly excited and light is concentrated into nanometer scale apertures, resulting in not only greatly enhanced NFL efficiency but also uniform distribution of light intensity for isolated and arrayed slit patterns. Also discussed is the enhancement dependence on the structural parameters of NFL masks.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: INTERFERENCE NANOLITHOGRAPHY ; SUBWAVELENGTH APERTURE ; TRANSMISSION ; PHOTOLITHOGRAPHY ; GRATINGS ; ARRAYS ; LIGHT
收录类别: SCI
语种: 英语
WOS记录号: WOS:000271900600003
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3276
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu, Peoples R China

Recommended Citation:
Zeng, Beibei,Pan, Li,Liu, Ling,et al. Improved near field lithography by surface plasmon resonance in groove-patterned masks[J]. JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS,2009,11(12).
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