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Plasmonic interference nanolithography with a double-layer planar silver lens structure
Zeng, Beibei; Yang, Xufeng; Wang, Changtao; Luo, Xiangang
Source PublicationOPTICS EXPRESS
Volume17Issue:19Pages:16783-16791
2009-09-14
Language英语
Indexed BySCI
WOS IDWOS:000269736100047
SubtypeArticle
AbstractWe present here a surface plasmon interference lithography method with double-layer planar silver lens. This kind of lithography method provides interference patterns with sufficient contrast for lithography process and simple structure for the convenience of fabrication. Rigorous coupled wave analysis method has been performed with practical parameters to testify this lithography scheme. Furthermore, some key factors influencing the pattern quality have been discussed. It is pointed out that three factors mainly determine the resolution of the interference patterns, and therefore we give a theoretical resolution limit of about 1/12 wavelength to the surface plasmon interference lithography method. (C) 2009 Optical Society of America
WOS KeywordLITHOGRAPHY ; FORMULATION ; RESOLUTION ; GRATINGS
WOS Research AreaOptics
WOS SubjectOptics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3257
Collection光电技术研究所被WoS收录文章
AffiliationChinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Zeng, Beibei,Yang, Xufeng,Wang, Changtao,et al. Plasmonic interference nanolithography with a double-layer planar silver lens structure[J]. OPTICS EXPRESS,2009,17(19):16783-16791.
APA Zeng, Beibei,Yang, Xufeng,Wang, Changtao,&Luo, Xiangang.(2009).Plasmonic interference nanolithography with a double-layer planar silver lens structure.OPTICS EXPRESS,17(19),16783-16791.
MLA Zeng, Beibei,et al."Plasmonic interference nanolithography with a double-layer planar silver lens structure".OPTICS EXPRESS 17.19(2009):16783-16791.
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