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题名:
Plasmonic interference nanolithography with a double-layer planar silver lens structure
作者: Zeng, Beibei; Yang, Xufeng; Wang, Changtao; Luo, Xiangang
刊名: OPTICS EXPRESS
出版日期: 2009-09-14
卷号: 17, 期号:19, 页码:16783-16791
文章类型: Article
英文摘要: We present here a surface plasmon interference lithography method with double-layer planar silver lens. This kind of lithography method provides interference patterns with sufficient contrast for lithography process and simple structure for the convenience of fabrication. Rigorous coupled wave analysis method has been performed with practical parameters to testify this lithography scheme. Furthermore, some key factors influencing the pattern quality have been discussed. It is pointed out that three factors mainly determine the resolution of the interference patterns, and therefore we give a theoretical resolution limit of about 1/12 wavelength to the surface plasmon interference lithography method. (C) 2009 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: LITHOGRAPHY ; FORMULATION ; RESOLUTION ; GRATINGS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000269736100047
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3257
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China

Recommended Citation:
Zeng, Beibei,Yang, Xufeng,Wang, Changtao,et al. Plasmonic interference nanolithography with a double-layer planar silver lens structure[J]. OPTICS EXPRESS,2009,17(19):16783-16791.
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