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题名:
Subwavelength nanolithography based on unidirectional excitation of surface plasmons
作者: Xu, Ting; Fang, Liang; Zeng, Beibei; Liu, Yao; Wang, Changtao; Feng, Qin; Luo, Xiangang
刊名: JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS
出版日期: 2009-08-01
卷号: 11, 期号:8
关键词: surface plasmon ; optical lithography ; interference
文章类型: Article
英文摘要: A subwavelength nanolithography technique based on unidirectional excitation of surface plasmons is proposed and numerically demonstrated by finite-difference time-domain analysis. Normal incident light impinging on a specially designed mask can excite two unidirectional surface plasmon waves (SPWs) with counter propagating directions on the unilluminated side. The simulation results show that the interference of these face-to-face SPWs launched by the mask could deliver about 50 nm half-pitch patterns at the operating wavelength of 365 nm, going far beyond the free space diffraction limit. This technique provides an effective fabrication method for nanostructures.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: INTERFERENCE NANOLITHOGRAPHY ; LITHOGRAPHY
收录类别: SCI
语种: 英语
WOS记录号: WOS:000268692400003
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3243
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu, Peoples R China

Recommended Citation:
Xu, Ting,Fang, Liang,Zeng, Beibei,et al. Subwavelength nanolithography based on unidirectional excitation of surface plasmons[J]. JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS,2009,11(8).
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