IOE OpenIR  > 光电技术研究所被WoS收录文章
Subwavelength nanolithography based on unidirectional excitation of surface plasmons
Xu, Ting; Fang, Liang; Zeng, Beibei; Liu, Yao; Wang, Changtao; Feng, Qin; Luo, Xiangang
Source PublicationJOURNAL OF OPTICS A-PURE AND APPLIED OPTICS
Volume11Issue:8
2009-08-01
Language英语
Indexed BySCI
WOS IDWOS:000268692400003
SubtypeArticle
AbstractA subwavelength nanolithography technique based on unidirectional excitation of surface plasmons is proposed and numerically demonstrated by finite-difference time-domain analysis. Normal incident light impinging on a specially designed mask can excite two unidirectional surface plasmon waves (SPWs) with counter propagating directions on the unilluminated side. The simulation results show that the interference of these face-to-face SPWs launched by the mask could deliver about 50 nm half-pitch patterns at the operating wavelength of 365 nm, going far beyond the free space diffraction limit. This technique provides an effective fabrication method for nanostructures.
KeywordSurface Plasmon Optical Lithography Interference
WOS KeywordINTERFERENCE NANOLITHOGRAPHY ; LITHOGRAPHY
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Cited Times:19[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/3243
Collection光电技术研究所被WoS收录文章
AffiliationChinese Acad Sci, State Key Lab Opt Technol Microfabricat, Inst Opt & Elect, Chengdu, Peoples R China
Recommended Citation
GB/T 7714
Xu, Ting,Fang, Liang,Zeng, Beibei,et al. Subwavelength nanolithography based on unidirectional excitation of surface plasmons[J]. JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS,2009,11(8).
APA Xu, Ting.,Fang, Liang.,Zeng, Beibei.,Liu, Yao.,Wang, Changtao.,...&Luo, Xiangang.(2009).Subwavelength nanolithography based on unidirectional excitation of surface plasmons.JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS,11(8).
MLA Xu, Ting,et al."Subwavelength nanolithography based on unidirectional excitation of surface plasmons".JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS 11.8(2009).
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