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题名:
The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling
作者: Fang Liang1; Du Jing-Lei1; Guo Xiao-Wei1; Wang Jing-Quan1; Zhang Zhi-You1; Luo Xian-Gang2; Du Chun-Lei2
刊名: CHINESE PHYSICS B
出版日期: 2008-07-01
卷号: 17, 期号:7, 页码:2499-2503
关键词: surface plasmon polaritons (SPPs) ; enhancement ; interference lithography ; resolution
文章类型: Article
英文摘要: The use of an attenuated total reflect ion-coup ling mode of prism coated with metal film to excite the interference of the surface plasmon polaritons (SPPs) was proposed for periodic patterning with a resolution of subwavelength scale. High intensity of electric field can be obtained because of the coupling between SPPs and evanescence under a resonance condition, which can reduce exposure time and improve contrast. In this paper, several critical parameters for maskless surface plasmon resonant lithography are described, and the preliminary simulation based on a finite difference time-domain technique agrees well with the theoretical analysis, which demonstrates this scheme and provides the theoretical basis for further experiments.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Physics, Multidisciplinary
研究领域[WOS]: Physics
关键词[WOS]: OPTICAL LITHOGRAPHY
收录类别: SCI
语种: 英语
WOS记录号: WOS:000257843000025
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/3236
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Fang Liang,Du Jing-Lei,Guo Xiao-Wei,et al. The theoretic analysis of maskless surface plasmon resonant interference lithography by prism coupling[J]. CHINESE PHYSICS B,2008,17(7):2499-2503.
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