IOE OpenIR  > 光电技术研究所博硕士论文
Thesis Advisor冯伯儒
Degree Grantor中国科学院光电技术研究所
Place of Conferral中国科学院光电技术研究所
Keyword全内反射全息术 全息微光刻 光刻技术
Other AbstractWith the development of photolithography technologies, large exposure field and higher resolution are required simultaneously. Resolution and image field must be traded off in conventional lithography methods. On the contrary, holographic microlithography with total internal reflection (TIR) allows high-resolution features and high-fidelity patterns to be printed over large exposure fields and brings a new capability to sub-half-micron patterns lithography. The principle and realization method of TIR holographic microlithography are analyzed thoroughly in the thesis. With the coupled wave theory, the influence on diffraction efficiency of hologram mask resulting from swelling or shrinking of recording material during processing and the change of the average permittivity between recording and reconstruction is also presented. The effect on lithography resolution coming from the reposition precision of hologram mask, reconstruction with wave-front non-conjugation and the polarization feature of the reconstruction beam etc. is investigated. At the same time, we also designed and manufactured the experiment system of TIR holographic microlithography. Through the use of experiment, we obtained the patterns which resolution and field sizes are basically only limited by the conventional photomask. The experimental results show that TIR holographic microlithography can provide simple geometry, high-resolution, large exposure field and high-fidelity print and it can achieve high-resolution lithography in the whole exposure field area.
Document Type学位论文
Recommended Citation
GB/T 7714
陈芬. 全内反射全息微光刻技术研究[D]. 中国科学院光电技术研究所. 中国科学院光电技术研究所,1999.
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