IOE OpenIR  > 光电技术研究所博硕士论文
Thesis Advisor姚汉民
Degree Grantor中国科学院光电技术研究所
Place of Conferral中国科学院光电技术研究所
Keyword光学光刻 逐场调平 多点检焦 控制算法 套刻 步进模型
Other AbstractTo improve resolution of optical reduction lithography is the key content of modern lithography. The main way for its resolution improvement is to increase the numerical aperture of lenses and to decrease the exposure wavelength, So the focal depth shrinks quickly, Field-by-field focusing and leveling used for increasing focus accuracy in whole exposure field and for make fully use of depth-of-focus become key technology for modern optical lithography. This paper presents a new field-by-field focusing and leveling method in which process of high precision video is used, introduces multi-point measure principle and its design method, analyses error and implement qualification of the new field-by-field focusing and leveling system, investigate control algorithm of this leveling movement, discusses coordinate systems of projection stepper and set up a stepping model o wafer stage for overlay when uses field-by-field focusing and leveling system according to these coordinate systems.
Document Type学位论文
Recommended Citation
GB/T 7714
胡松. 高精度逐场调平技术研究[D]. 中国科学院光电技术研究所. 中国科学院光电技术研究所,1999.
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