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题名:
Moire-Based Absolute Interferometry With Large Measurement Range in Wafer-Mask Alignment
作者: Di, Chengliang1,2; Yan, Wei2; Hu, Song2; Yin, Didi1,3; Ma, Chifei1,2
刊名: IEEE PHOTONICS TECHNOLOGY LETTERS
出版日期: 2015-02-15
卷号: 27, 期号:4
关键词: Moire fringes ; measurement range ; wafer-mask alignment ; lithography
文章类型: Article
英文摘要: The moire-based interferometry is demonstrated to significantly improve the measurement range in wafer-mask alignment by adopting two specifically designed four-quadrant grating marks. These relationships between the measurement range, the moire periods and the accuracy of the moire-based detection algorithm are deduced. By demodulating the transverse shifts of the moire fringes with two kinds of periods, the final misalignment can be accurately determined. An experimental setup of the wafer-mask alignment is constructed to explore the feasibility and effectiveness of proposed approach. Results indicate that with the established configurations, the measurement range can be readily extended to 120 mu m, which is dozens of times larger than conventional methods, and meanwhile the detection accuracy retains to be at nanometers level.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Optics ; Physics
关键词[WOS]: LITHOGRAPHY ; PROJECTION ; GRATINGS ; FRINGES
收录类别: SCI
语种: 英语
WOS记录号: WOS:000349111700012
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2533
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
3.Chinese Acad Sci, Key Lab Beam Control, Chengdu 610209, Peoples R China

Recommended Citation:
Di, Chengliang,Yan, Wei,Hu, Song,et al. Moire-Based Absolute Interferometry With Large Measurement Range in Wafer-Mask Alignment[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2015,27(4).
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