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Gap-optimized Moire phase imaging alignment for proximity lithography
Zhu, Jiangping1; Hu, Song2; You, Zhisheng1; Su, Xianyu3
Source PublicationOPTICAL ENGINEERING
Volume54Issue:1
2015
Language英语
Indexed BySCI
WOS IDWOS:000349442900047
SubtypeArticle
AbstractThe proposed four-quadrant Moire alignment scheme to detect the misalignment between mask and wafer for proximity lithography can achieve the alignment accuracy with nanometer level. When implementing the scheme, however, the distribution of Moire fringes associated with the mask-wafer gap indeed goes against the alignment, making the gap optimization highly urgent. The optimization model is established, and numerical simulation as well as experimental verification is also provided. Furthermore, an alignment accuracy of similar to 3 nm with the illumination wavelength of 632.8 nm is experimentally attained. Simultaneously, the design mechanism of alignment marks for improving the availability of the alignment scheme is discussed. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
KeywordLithography Alignment Moire Techniques
WOS KeywordFRINGE ; GRATINGS
WOS Research AreaOptics
WOS SubjectOptics
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/2531
Collection光电技术研究所被WoS收录文章
Affiliation1.Sichuan Univ, Sch Comp Sci & Technol, Chengdu 610064, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
3.Sichuan Univ, Sch Elect & Informat, Chengdu 610064, Peoples R China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,You, Zhisheng,et al. Gap-optimized Moire phase imaging alignment for proximity lithography[J]. OPTICAL ENGINEERING,2015,54(1).
APA Zhu, Jiangping,Hu, Song,You, Zhisheng,&Su, Xianyu.(2015).Gap-optimized Moire phase imaging alignment for proximity lithography.OPTICAL ENGINEERING,54(1).
MLA Zhu, Jiangping,et al."Gap-optimized Moire phase imaging alignment for proximity lithography".OPTICAL ENGINEERING 54.1(2015).
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