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题名:
Gap-optimized Moire phase imaging alignment for proximity lithography
作者: Zhu, Jiangping1; Hu, Song2; You, Zhisheng1; Su, Xianyu3
刊名: OPTICAL ENGINEERING
出版日期: 2015
卷号: 54, 期号:1
关键词: lithography ; alignment ; Moire techniques
文章类型: Article
英文摘要: The proposed four-quadrant Moire alignment scheme to detect the misalignment between mask and wafer for proximity lithography can achieve the alignment accuracy with nanometer level. When implementing the scheme, however, the distribution of Moire fringes associated with the mask-wafer gap indeed goes against the alignment, making the gap optimization highly urgent. The optimization model is established, and numerical simulation as well as experimental verification is also provided. Furthermore, an alignment accuracy of similar to 3 nm with the illumination wavelength of 632.8 nm is experimentally attained. Simultaneously, the design mechanism of alignment marks for improving the availability of the alignment scheme is discussed. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: FRINGE ; GRATINGS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000349442900047
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2531
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Sichuan Univ, Sch Comp Sci & Technol, Chengdu 610064, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
3.Sichuan Univ, Sch Elect & Informat, Chengdu 610064, Peoples R China

Recommended Citation:
Zhu, Jiangping,Hu, Song,You, Zhisheng,et al. Gap-optimized Moire phase imaging alignment for proximity lithography[J]. OPTICAL ENGINEERING,2015,54(1).
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