IOE OpenIR  > 光电技术研究所被WoS收录文章
Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition
Zhu, Jiangping1; Hu, Song2; Su, Xianyu1; You, Zhisheng1
Source PublicationIEEE PHOTONICS TECHNOLOGY LETTERS
Volume27Issue:4
2015-02-15
Language英语
Indexed BySCI
WOS IDWOS:000349111700002
SubtypeArticle
AbstractThe recently proposed four-quadrant grating Moire fringe alignment scheme was demonstrated to have the potential of achieving nanometer alignment for proximity lithography. The mask-wafer misalignment was accurately detected by comparing the phase between two sets of Moire fringes averaged along with the fringe direction, making the inclination adjustment of Moire fringes highly imperative. The inclination closely related with the included angle between mask (alignment mark) and wafer (alignment mark) largely influences the alignment accuracy. To solve this issue, we present an adjustment strategy based on the spatial frequency decomposition of two sets of differential Moire fringes, by which the included angle can be accurately adjusted with an accuracy of better than 10-5 rad. The subsequent discussion indicates that the position of imaging system can be responsible for the inclination but actually it would not affect the mask-wafer alignment, so that our proposed adjustment strategy can be operated simply and feasibly, which is validated by the theoretical analysis and experimental results.
KeywordProximity Lithography Mask-wafer Alignment Phase Analysis Spatial Frequency
WOS KeywordPROXIMITY LITHOGRAPHY ; IMAGING METHOD ; ANGLE ; DISPLACEMENT ; GRATINGS
WOS Research AreaEngineering ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Optics ; Physics, Applied
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/2524
Collection光电技术研究所被WoS收录文章
Affiliation1.Sichuan Univ, Sch Comp Sci & Technol, Chengdu 610064, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Su, Xianyu,et al. Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition[J]. IEEE PHOTONICS TECHNOLOGY LETTERS,2015,27(4).
APA Zhu, Jiangping,Hu, Song,Su, Xianyu,&You, Zhisheng.(2015).Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition.IEEE PHOTONICS TECHNOLOGY LETTERS,27(4).
MLA Zhu, Jiangping,et al."Adjustment Strategy for Inclination Moire Fringes in Lithography by Spatial Frequency Decomposition".IEEE PHOTONICS TECHNOLOGY LETTERS 27.4(2015).
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