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题名:
Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography
作者: Li, Jinlong; Hu, Song; Zhao, Lixin
刊名: OPTIK
出版日期: 2014
卷号: 125, 期号:22, 页码:6775-6777
关键词: Focal plane ; PGFM ; Focus control ; Lithography
文章类型: Article
英文摘要: The high-precision focus control technology becomes more and more important, as the effective depth of focus (DOF) shortens dramatically in advanced lithography. In conventional focus control technology, the focal plane of projection lens is assumed as an ideal plane, but in fact it is a curved surface. The difference between the ideal plane assumed and its real shape results in partial defocus of wafer exposure field, thereby affecting the exposure quality. In our current work, the real shape of projection lens focal plane is brought into consideration for the focus control, and the simulation shows that this method can effectively improve the accuracy of focus control by 26%. (C) 2014 Elsevier GmbH. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: SCANNERS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000344976300035
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2522
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Sichuan, Peoples R China

Recommended Citation:
Li, Jinlong,Hu, Song,Zhao, Lixin. Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography[J]. OPTIK,2014,125(22):6775-6777.
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