中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 光电技术研究所被WoS收录文章  > 期刊论文
题名:
Influence of Collimation on Alignment Accuracy in Proximity Lithography
作者: Wang, Nan1,2; Jiang, Wei1; Zhu, Jiangping3; Tang, Yan1; Yan, Wei1; Tong, Junmin4; Hu, Song1
刊名: IEEE PHOTONICS JOURNAL
出版日期: 2014-08-01
卷号: 6, 期号:4
关键词: Collimation ; moire fringe ; lithography alignment
文章类型: Article
英文摘要: The alignment method based on moire imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moire fringe to measure the relative linear displacement between the mask and the wafer. However, this method is only theoretically accurate due to the affection of certain parameters, such as the optical beam collimation. In this paper, the influence of collimation on the alignment accuracy is thoroughly analyzed. The theoretical analyses and simulation results indicate that the alignment accuracy, which was observed just behind the test grating, is sensitive to the divergence or convergence angle of incident light. On this basis, the method for the error correction is proposed and confirmed.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Optics ; Physics
关键词[WOS]: UNPARALLEL GRATING PLANES ; X-RAY-LITHOGRAPHY ; TALBOT INTERFEROMETRY ; MOIRE FRINGE
收录类别: SCI
语种: 英语
WOS记录号: WOS:000342912700013
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2518
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

Files in This Item:

There are no files associated with this item.


作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100039, Peoples R China
3.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
4.Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China

Recommended Citation:
Wang, Nan,Jiang, Wei,Zhu, Jiangping,et al. Influence of Collimation on Alignment Accuracy in Proximity Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(4).
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Wang, Nan]'s Articles
[Jiang, Wei]'s Articles
[Zhu, Jiangping]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Wang, Nan]‘s Articles
[Jiang, Wei]‘s Articles
[Zhu, Jiangping]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace