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题名:
A Moire-Based Four-Channel Focusing and Leveling Scheme for Projection Lithography
作者: Di, Chengliang1,2; Yan, Wei1; Hu, Song1; Li, Yanli1; Yin, Didi2; Tang, Yan1; Tong, Junmin3
刊名: IEEE PHOTONICS JOURNAL
出版日期: 2014-08-01
卷号: 6, 期号:4
关键词: Moire fringes ; focusing and leveling ; fringe analysis ; lithography
文章类型: Article
英文摘要: Focusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moire fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling scheme is proposed and demonstrated. These relationships between the tilted amount of wafer, the vertical defocusing amount, and the phase distributions of moire fringes are deduced. A single-channel experimental setup is constructed to verify the performances of proposed method. Results indicate that the tilted amount and the vertical defocusing amount can be precisely detected with accuracy at 10(-4) rad and several nanometers level, respectively, and therefore meet the demand of the high-demanding focusing and leveling processes.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Optics ; Physics
关键词[WOS]: ALIGNMENT ; STEPPERS ; SENSOR
收录类别: SCI
语种: 英语
WOS记录号: WOS:000342912700017
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2501
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China

Recommended Citation:
Di, Chengliang,Yan, Wei,Hu, Song,et al. A Moire-Based Four-Channel Focusing and Leveling Scheme for Projection Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(4).
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