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IOE OpenIR  > 光电技术研究所被WoS收录文章  > 期刊论文
题名:
Nanochannel fabrication by imprinting-induced cracks
作者: Xia, Liangping1,2; Zhang, Man2; Yang, Zheng1; Cui, Hongliang1; Yin, Shaoyun1; Hu, Song2; Du, Chunlei1
刊名: APPLIED PHYSICS LETTERS
出版日期: 2014-02-17
卷号: 104, 期号:7
文章类型: Article
英文摘要: A simple and low-cost process of imprinting-induced cracks is proposed to fabricate controllable nanochannel structures with high depth-to-width ratio, in ultraviolet (UV) curable photoresist. The nanochannels are formed by the cracks of UV-curable photoresist due to its volume reduction as a result of solidification, with imprinting induced predesigned crack patterns. The proposed process is demonstrated with a nanochannel structure consisting of a periodically distributed hexagonal 30 nm-width and 100 nm-depth channels, which is fabricated by anodic aluminum oxide template imprinting induced cracks on a thiolene UV-curable photoresist. A finite element analysis provided theoretical foundation for the process, shedding lights on the parameters influencing the process. (C) 2014 AIP Publishing LLC.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Physics, Applied
研究领域[WOS]: Physics
关键词[WOS]: RESTORATIONS ; FILM
收录类别: SCI
语种: 英语
WOS记录号: WOS:000332038500056
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2489
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Key Lab Multiscale Mfg Technol, Chongqing Inst Green & Intelligent Technol, Chongqing 400714, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Xia, Liangping,Zhang, Man,Yang, Zheng,et al. Nanochannel fabrication by imprinting-induced cracks[J]. APPLIED PHYSICS LETTERS,2014,104(7).
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