IOE OpenIR  > 光电技术研究所被WoS收录文章
Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography
Di, Chengliang1,2; Hu, Song1; Yan, Wei1; Li, Yanli1; Li, Guang1,2; Tong, Junmin3
Source PublicationIEEE PHOTONICS JOURNAL
Volume6Issue:3
2014-06-01
Language英语
Indexed BySCI
WOS IDWOS:000340830400010
SubtypeArticle
AbstractFocusing of wafer plane is an essential factor to determine the ultimate feature size of the stepper such as projection lithographic system. Based on Michelson interferometeric system, this paper demonstrates an interferometric focusing scheme for projection lithography to coaxially locate the ideal focal plane of the projective objective. The collimated incident laser beam is divided into the reference arm and object arm. The latter propagates through the objective lens and then interferes with the slightly deflected reference beam that reflected back by a fixed mirror, giving rise to an interferential pattern on the CCD. Any amounts of defocusing can be directly indicated from the demodulated phase of the interferential pattern. In this manner, the focusing sensitivity at nanometer scale is experimentally attainable, which shows great superiority over traditional methods, particularly the limited focal length of current projective objective lens.
KeywordInterferometry Metrology Fringe Analysis Phase Unwrapping Lithography
WOS KeywordALIGNMENT ; STEPPERS
WOS Research AreaEngineering ; Optics ; Physics
WOS SubjectEngineering, Electrical & Electronic ; Optics ; Physics, Applied
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/2482
Collection光电技术研究所被WoS收录文章
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.Xuchang Vocat & Tech Coll, Xuchang 461000, Peoples R China
Recommended Citation
GB/T 7714
Di, Chengliang,Hu, Song,Yan, Wei,et al. Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography[J]. IEEE PHOTONICS JOURNAL,2014,6(3).
APA Di, Chengliang,Hu, Song,Yan, Wei,Li, Yanli,Li, Guang,&Tong, Junmin.(2014).Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography.IEEE PHOTONICS JOURNAL,6(3).
MLA Di, Chengliang,et al."Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography".IEEE PHOTONICS JOURNAL 6.3(2014).
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