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题名:
Moire interferometry with high alignment resolution in proximity lithographic process
作者: Zhou, Shaolin1,4; Hu, Song2; Fu, Yongqi3; Xu, Xiangmin1; Yang, Jun4
刊名: APPLIED OPTICS
出版日期: 2014-02-10
卷号: 53, 期号:5, 页码:951-959
文章类型: Article
英文摘要: Moire interferometry is widely used as the precise metrology in many science and engineering fields. The schemes of moires-based interferometry adopting diffraction gratings are presented in this paper for applications in a proximity lithographic system such as wafer-mask alignment, the in-plane twist angle adjustment, and tilts remediation. For the sake of adjustment of lateral offset as well as the tilt and in-plane twist angle, schemes of the (m, -m) and (m, 0) moire interferometry are explored, respectively. Fundamental derivation of the moire interferometry and schemes for related applications are provided. Three pairs of gratings with close periods are fabricated to form the composite grating. And experiments are performed to confirm the moire interferometry for related applications in our proximity lithographic system. Experimental results indicate that unaligned lateral offset is detectable with resolution at the nanometer level, and the tilt and in-plane twist angle between wafer and mask could be manually decreased down to the scope of 10(-3) and 10(-4) rad, respectively. (C) 2014 Optical Society of America
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: X-RAY-LITHOGRAPHY ; SOFT LITHOGRAPHY ; SYSTEM ; PHOTOLITHOGRAPHY ; FABRICATION ; FRINGES ; LIMITS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000331368300022
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2479
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.S China Univ Technol, Sch Elect & Informat Engn, Guangzhou 510640, Guangdong, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Microfabricat, Chengdu 610209, Peoples R China
3.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China
4.Univ Western Ontario, Dept Mech & Mat Engn, London, ON N6A 5B9, Canada

Recommended Citation:
Zhou, Shaolin,Hu, Song,Fu, Yongqi,et al. Moire interferometry with high alignment resolution in proximity lithographic process[J]. APPLIED OPTICS,2014,53(5):951-959.
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