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题名:
Experimental study of Talbot imaging moire-based lithography alignment method
作者: Zhu, Jiangping1,2,3; Hu, Song1; Zhou, Pei1,3; Yu, Junsheng2
刊名: OPTICS AND LASERS IN ENGINEERING
出版日期: 2014-07-01
卷号: 58, 页码:54-59
关键词: Alignment ; Moire techniques ; Gratings ; Talbot and self-imaging effects
文章类型: Article
英文摘要: A four-quadrant gratings alignment method was presented for proximity lithography, which experimentally achieved the alignment accuracy of nanometer level. The alignment marks consist of gratings with slightly different periods, leading to different Talbot distances with the same monochromatic planar wave. The contrast of moire fringe varies with the gap between mask (alignment mark) and wafer (alignment mark), which will affect the phase comparison, and induce more errors as well. This paper concentrates on the optimization of parameters of alignment marks to achieve the resulting moire fringes with an optimum contrast. By simulation and experiment, we investigate effects of the gap on the contrast, based on which, the design principle of alignment marks is concluded, and it is helpful to the practicability with our proposed alignment method. (C) 2014 Elsevier Ltd. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: X-RAY-LITHOGRAPHY ; NANOIMPRINT LITHOGRAPHY ; PROXIMITY LITHOGRAPHY ; FRINGE ; GRATINGS ; SYSTEM ; IMAGES
收录类别: SCI
语种: 英语
WOS记录号: WOS:000334818300008
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2467
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
3.Univ Chinese Acad Sci, Beijing 100039, Peoples R China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Zhou, Pei,et al. Experimental study of Talbot imaging moire-based lithography alignment method[J]. OPTICS AND LASERS IN ENGINEERING,2014,58:54-59.
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