中国科学院光电技术研究所机构知识库
Advanced  
IOE OpenIR  > 光电技术研究所被WoS收录文章  > 期刊论文
题名:
A modified alignment method based on four-quadrant-grating moire for proximity lithography
作者: Di, Chengliang1,2; Zhu, Jiangping1,2,3; Yan, Wei1; Hu, Song1
刊名: OPTIK
出版日期: 2014
卷号: 125, 期号:17, 页码:4868-4872
关键词: Coarse alignment ; Fine alignment ; Image processing ; Moire fringe
文章类型: Article
英文摘要: In this paper, we demonstrate a modified coarse-fine alignment scheme designed for proximity lithography. Both wafer alignment mark and mask alignment mark consists of linear grating arrays and "+" bar. Coarse alignment and fine alignment could work together to achieve the perfect alignment. Thereinto, coarse alignment, measured from two superposed "+" bars, guarantees the misalignment across wafer and mask within the measurement range of fine alignment, which is based on moire fringes formed by the superposition of linear grating arrays. Then we conduct the experiments using a nanometer actuator to drive the wafer alignment mark meanwhile keeping the mask alignment mark motionless, which validates the feasibility and rationality of our designed scheme. (C) 2014 Elsevier GmbH. All rights reserved.
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: X-RAY-LITHOGRAPHY ; PLATE-ARRAY LITHOGRAPHY ; FRINGE ; GRATINGS ; SYSTEM
收录类别: SCI
语种: 英语
WOS记录号: WOS:000341897100061
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2443
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

Files in This Item:

There are no files associated with this item.


作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100039, Peoples R China
3.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China

Recommended Citation:
Di, Chengliang,Zhu, Jiangping,Yan, Wei,et al. A modified alignment method based on four-quadrant-grating moire for proximity lithography[J]. OPTIK,2014,125(17):4868-4872.
Service
Recommend this item
Sava as my favorate item
Show this item's statistics
Export Endnote File
Google Scholar
Similar articles in Google Scholar
[Di, Chengliang]'s Articles
[Zhu, Jiangping]'s Articles
[Yan, Wei]'s Articles
CSDL cross search
Similar articles in CSDL Cross Search
[Di, Chengliang]‘s Articles
[Zhu, Jiangping]‘s Articles
[Yan, Wei]‘s Articles
Related Copyright Policies
Null
Social Bookmarking
Add to CiteULike Add to Connotea Add to Del.icio.us Add to Digg Add to Reddit
所有评论 (0)
暂无评论
 
评注功能仅针对注册用户开放,请您登录
您对该条目有什么异议,请填写以下表单,管理员会尽快联系您。
内 容:
Email:  *
单位:
验证码:   刷新
您在IR的使用过程中有什么好的想法或者建议可以反馈给我们。
标 题:
 *
内 容:
Email:  *
验证码:   刷新

Items in IR are protected by copyright, with all rights reserved, unless otherwise indicated.

 

 

Valid XHTML 1.0!
Copyright © 2007-2016  中国科学院光电技术研究所 - Feedback
Powered by CSpace