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题名:
Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography
作者: Zhang, Wei; Yao, Na; Wang, Changtao; Zhao, Zeyu; Wang, Yanqin; Gao, Ping; Luo, Xiangang
刊名: PLASMONICS
出版日期: 2014-12-01
卷号: 9, 期号:6, 页码:1333-1339
关键词: Nanolithography ; Surface plasmon ; Illumination design
文章类型: Article
英文摘要: Off axis illumination (OAI) technique combined with planar hyperlens is applied to achieve the non-contacted deep subwavelength demagnifying lithography. The designed OAI is confirmed to shift the spatial spectra of mask, leading to enhancement of the featured wavevectors components. On the other hand, the reflection effect of Ag cladding is necessary to obtain high contrast and high fidelity of nanopattern lithography. It is numerically demonstrated that the half-pitch resolution 32 nm with OAI (NA = 1.37) is obtained under 80 nm air working distance, which is about six times than the case of the conventional configuration under normal illumination (NA = 0). Further simulations show that the minimum half-pitch resolution of the planar hyperlens with OAI could reach 18 nm (similar to lambda/20).
WOS标题词: Science & Technology ; Physical Sciences ; Technology
类目[WOS]: Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
研究领域[WOS]: Chemistry ; Science & Technology - Other Topics ; Materials Science
关键词[WOS]: DIFFRACTION LIMIT ; SILVER SUPERLENS ; PERFECT LENS ; PHOTOLITHOGRAPHY
收录类别: SCI
语种: 英语
WOS记录号: WOS:000345146800010
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内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2438
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China

Recommended Citation:
Zhang, Wei,Yao, Na,Wang, Changtao,et al. Off Axis Illumination Planar Hyperlens for Non-contacted Deep Subwavelength Demagnifying Lithography[J]. PLASMONICS,2014,9(6):1333-1339.
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