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题名:
High resolution photolithography with sub-wavelength grating
作者: Zhao, Qing1; Liang, Gaofeng1,2; Wang, Changtao2; Huang, Xiaoping1; Chen, Zexiang3; Luo, Xiangang2
刊名: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
出版日期: 2014-04-01
卷号: 115, 期号:1, 页码:69-73
文章类型: Article
英文摘要: Based on the theory of surface plasmon resonance and the special nano-optical effect of metal/dielectric multilayer composites, we obtained a high-resolution image of a sub-wavelength grating. We discussed multilayer parameters on equal thickness, and achieved sufficient contrast and high intensity through numerical simulation based on the finite element method. By chosen the best scheme, an experimental of multilayer planar lens lithography has been carried out. The main point is the use of metal-dielectric composites to realize high-resolution image under 365-nm polarization light incidence. By controlling the experimental parameters accurately, a fidelity image is recorded on the photoresist.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Materials Science, Multidisciplinary ; Physics, Applied
研究领域[WOS]: Materials Science ; Physics
关键词[WOS]: SILVER SUPERLENS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000333612400012
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2419
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, State Key Lab Opt Technol Nanofabricat & Microeng, Chengdu 610209, Peoples R China
3.Univ Elect Sci & Technol China, Sch Opt Elect Informat, Chengdu 610054, Peoples R China

Recommended Citation:
Zhao, Qing,Liang, Gaofeng,Wang, Changtao,et al. High resolution photolithography with sub-wavelength grating[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2014,115(1):69-73.
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