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题名:
Fabrication of circular microstructure array based on a controlled diffractive pattern
作者: Li, Shuhong1,2; Du, Jinglei1; Zhang, Zhiyou1; Gao, Fuhua1; Gao, Hongtao2; Du, Chunlei2
刊名: MICROELECTRONIC ENGINEERING
出版日期: 2014-03-01
卷号: 115, 页码:13-15
关键词: Lithography ; Circular microstructure ; Diffractive pattern
文章类型: Article
英文摘要: Subwavelength metal circular structures have wide potential applications for the higher transmission efficiency than holes. A circular structures fabrication method is demonstrated by employing the diffraction pattern generated with some available regular structures. The inversion algorithm of the parameters of diffractive object is built from the required diffractive pattern based on the scalar diffractive theory. To validate the approach, a circular screen in array with size of 1.1 mu m was designed and fabricated as mask. Finally, an annulus array with feature size of 680 nm is formed in the resist. (C) 2013 Elsevier B.V. All rights reserved.
WOS标题词: Science & Technology ; Technology ; Physical Sciences
类目[WOS]: Engineering, Electrical & Electronic ; Nanoscience & Nanotechnology ; Optics ; Physics, Applied
研究领域[WOS]: Engineering ; Science & Technology - Other Topics ; Optics ; Physics
关键词[WOS]: RADIALLY POLARIZED-LIGHT ; SURFACE-PLASMONS ; TRANSMISSION ; LITHOGRAPHY ; APERTURE ; BEAM ; LENS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000330502700004
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2415
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Sichuan Univ, Sch Phys, Chengdu 610064, Peoples R China
2.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China

Recommended Citation:
Li, Shuhong,Du, Jinglei,Zhang, Zhiyou,et al. Fabrication of circular microstructure array based on a controlled diffractive pattern[J]. MICROELECTRONIC ENGINEERING,2014,115:13-15.
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