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Alignment method based on matched dual-grating moire fringe for proximity lithography
Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1
Source PublicationOPTICAL ENGINEERING
Volume51Issue:11
2012-11-01
Language英语
Indexed BySCI
WOS IDWOS:000314462100029
SubtypeArticle
AbstractThe application of dual-grating moire fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moire fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moire fringe. The relationship between phase of moire fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.OE.51.11.113603]
KeywordLithography Alignment Moire Fringe Angular Displacement
WOS KeywordX-RAY-LITHOGRAPHY ; GRAPHICAL ANALYSIS ; IMAGING METHOD ; SYSTEM ; PRECISION ; PATTERNS
WOS Research AreaOptics
WOS SubjectOptics
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Document Type期刊论文
Identifierhttp://ir.ioe.ac.cn/handle/181551/2378
Collection光电技术研究所被WoS收录文章
Affiliation1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China
Recommended Citation
GB/T 7714
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Alignment method based on matched dual-grating moire fringe for proximity lithography[J]. OPTICAL ENGINEERING,2012,51(11).
APA Zhu, Jiangping,Hu, Song,Yu, Junsheng,&Tang, Yan.(2012).Alignment method based on matched dual-grating moire fringe for proximity lithography.OPTICAL ENGINEERING,51(11).
MLA Zhu, Jiangping,et al."Alignment method based on matched dual-grating moire fringe for proximity lithography".OPTICAL ENGINEERING 51.11(2012).
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