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题名:
Alignment method based on matched dual-grating moire fringe for proximity lithography
作者: Zhu, Jiangping1,2,3; Hu, Song1; Yu, Junsheng2; Tang, Yan1
刊名: OPTICAL ENGINEERING
出版日期: 2012-11-01
卷号: 51, 期号:11
关键词: lithography alignment ; moire fringe ; angular displacement
文章类型: Article
英文摘要: The application of dual-grating moire fringe is introduced in lithography alignment. Minute angular displacement between the two alignment marks will lead to the tilt of moire fringe, which has an influence in high-accuracy alignment. Proposed is a novel measurement method of angular displacement based on the phase of moire fringe. The relationship between phase of moire fringe and angular displacement is analyzed. Both simulation and experiment indicate that an angular displacement can be determined to achieve a linear displacement measurement with error of nanometer level. (C) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.OE.51.11.113603]
WOS标题词: Science & Technology ; Physical Sciences
类目[WOS]: Optics
研究领域[WOS]: Optics
关键词[WOS]: X-RAY-LITHOGRAPHY ; GRAPHICAL ANALYSIS ; IMAGING METHOD ; SYSTEM ; PRECISION ; PATTERNS
收录类别: SCI
语种: 英语
WOS记录号: WOS:000314462100029
Citation statistics:
内容类型: 期刊论文
URI标识: http://ir.ioe.ac.cn/handle/181551/2378
Appears in Collections:光电技术研究所被WoS收录文章_期刊论文

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作者单位: 1.Chinese Acad Sci, Inst Opt & Elect, Chengdu 610209, Peoples R China
2.Univ Elect Sci & Technol China, Sch Optoelect Informat, Chengdu 610054, Peoples R China
3.Chinese Acad Sci, Grad Univ, Beijing 100039, Peoples R China

Recommended Citation:
Zhu, Jiangping,Hu, Song,Yu, Junsheng,et al. Alignment method based on matched dual-grating moire fringe for proximity lithography[J]. OPTICAL ENGINEERING,2012,51(11).
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